2O3部分穩(wěn)定的ZrO2）涂層顯微結構的影響規(guī)律，采用噴霧造粒技術制備了晶須含量分別為0%、1%、2%和3%（質量分數）的團聚YSZ顆粒（0#、1#、2#和3#粉末），利用等離子噴涂技術（APS）分別制備了0#、1#、2#和3#等4組涂層。利用掃描電鏡（SEM）及金相顯微鏡等測試分析設備研究SiC晶須分散工藝和定量表征方法，以及團聚顆粒的形態(tài)和涂層的顯微結構，并分析了含晶須涂層的成型過程。結果表明：機械攪拌時間增加至5 h時，晶須具有較好的分散程度，對應的晶須面積分數為11.03%。含晶須的團聚顆粒主要呈“水滴狀”和“紡錘狀”，1#、2#和3#粉末中“水滴狀”和“紡錘狀”團聚顆粒的數量比例分別為16.5%，22.7%和39.3%。由于非水平態(tài)晶須對顆粒中未熔融原粉末在沖擊和鋪展過程的阻礙作用，涂層的孔隙率隨著晶須含量的增加而增加，0#涂層的孔隙率為3.89%，1#、2#和3#涂層的孔隙率分別是0#涂層的3.15倍、4.17倍和7.52倍。;Agglomerated YSZ (Y2O3 partially stabilized ZrO2) particles with 0wt%, 1wt%, 2wt% and 3wt% of whiskers (named as 0#,1#, 2# and 3# powders, respectively) were prepared by spray granulation technology. Four groups of coatings (0#, 1#, 2# and 3# coating) were prepared by APS (atmospheric plasma spraying). The dispersion and quantitative characterization of SiC whiskers, morphology of agglomerated particles and microstructure of the coatings were studied by SEM (scanning electron microscopy) and light-optical microscopy, and the forming process of the coating containing SiC whiskers was analyzed. The result shows that as the stirring time increases to 5 h, the whiskers show better dispersion and the corresponding area percentage of whiskers of the specimen is 11.03%. The particles containing whiskers are mainly “droplet shaped” and “spindle shaped”, and the percentage of these two streamlined particles in 1#, 2# and 3# powders is 16.5%, 22.7% and 39.3%, respectively. Due to the obstructing effect of non-horizontal state whiskers on impacting and spreading process of unmelted raw powders, the porosity increases as the whiskers content increases. The porosity of 0# coating is 3.89%, while the porosity of 1#, 2# and 3# coatings is 3.15, 4.17 and 7.52 times larger than that of 0# coating, respectively."/>