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多弧離子鍍與磁控濺射共沉積TiCN薄膜的耐蝕性研究
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遼寧工程技術(shù)大學(xué),遼寧工程技術(shù)大學(xué),遼寧工程技術(shù)大學(xué),遼寧工程技術(shù)大學(xué),遼寧工程技術(shù)大學(xué),遼寧工程技術(shù)大學(xué)

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Study of corrosion resistance of TiCN films with combining multi-arc ion plating and magnetron sputtering technique
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Liaoning Technical University,Liaoning Technical University,Liaoning Technical University,Liaoning Technical University,Liaoning Technical University,Liaoning Technical University

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Science and Technology Research Project of Education Department of Liaoning Provincial (LJYL007)

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    摘要:

    采用多弧離子鍍-磁控濺射復(fù)合技術(shù)在AISI304不銹鋼基體表面于Ar和N2混合氣氛下共濺射鈦靶和石墨靶制備了TiCN薄膜,研究了占空比對(duì)TiCN薄膜結(jié)構(gòu)和在3.5 wt.%NaCl 中耐蝕性的影響規(guī)律。結(jié)果表明:所沉積的TiCN薄膜表面光滑、均勻致密,主要形成具有 Ti-(C,N) 鍵的fcc-TiN型結(jié)構(gòu)和少量的a-CNx化合物,并隨著占空比的增加表現(xiàn)出(111)晶面擇優(yōu)取向。TiCN薄膜相比于基體表現(xiàn)出更好的耐蝕性能,且隨著占空比的增大,薄膜的耐蝕性逐漸提高。當(dāng)占空比為40%時(shí),TiCN薄膜表現(xiàn)出最為優(yōu)異的抗腐蝕性能,其自腐蝕電流密度(icorr)和極化電阻(Rp)分別為3.262×10-7 A.cm-2和238.4 kΩ.cm2。薄膜的阻抗譜顯示腐蝕離子的滲透行為和局部腐蝕過(guò)程是影響電極體系腐蝕反應(yīng)過(guò)程中的主要?jiǎng)恿W(xué)因素,這與極化曲線的分析結(jié)果相一致。

    Abstract:

    TiCN films were deposited on AISI 304 stainless steel substrate by combining multi-arc ion plating and magnetron sputtering technique with ionizing titanium and graphite targets in an Ar+N2 mixture gas. The effect of duty ratio on the microstructure and corrosion resistance performance of TiCN films in a NaCl 3.5 wt.% solution was investigated. The results show that the as-deposited films reveal smooth, uniform and dense morphologies, mainly forming a fcc-TiN type structure with Ti-(C,N) bond as well as few a-CNx, and presenting (111) preferred orientation with the increase of duty ratio. TiCN films display a better resistance to corrosion than the bare substrate, as the duty ratio increased, the corrosion resistance property is enhanced gradually. When the duty ratio is 40%, the TiCN film shows the optimal one with a corrosion current density (icorr) of 3.262×10-7 A.cm-2 and a polarization resistance (Rp) of 238.4 kΩ.cm2, respectively. Electrochemical impedance spectroscopy (EIS) of the films also indicate that the penetration behavior of corrosive ions and the local corrosion process are two key factors affecting the electrode corrosion reaction kinetics process, which is in agreement with the polarization curves analysis results.

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趙瑞山,任鑫,王瑋,宋曉龍,張洋,張翀翊.多弧離子鍍與磁控濺射共沉積TiCN薄膜的耐蝕性研究[J].稀有金屬材料與工程,2018,47(7):2028~2036.[zhaoruishan, renxin, wangwei, songxiaolong, zhangyang, zhangchongyi. Study of corrosion resistance of TiCN films with combining multi-arc ion plating and magnetron sputtering technique[J]. Rare Metal Materials and Engineering,2018,47(7):2028~2036.]
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  • 收稿日期:2016-11-04
  • 最后修改日期:2017-11-24
  • 錄用日期:2017-11-28
  • 在線發(fā)布日期: 2018-10-10
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