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電弧源自身大顆粒抑制技術(shù)研究進(jìn)展
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作者單位:

1.安徽工業(yè)大學(xué) 先進(jìn)金屬材料綠色制備與表面技術(shù)教育部重點實驗室,安徽 馬鞍山 243002;2.中國空間技術(shù)研究院,北京 100094

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基金項目:

安徽省高等學(xué)校自然科學(xué)研究項目(KJ2021A0392);安徽省重點研究與開發(fā)計劃項目(202004b11020011)


Review of Macroparticle Suppression Methods in Arc Source
Author:
Affiliation:

1.Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials, Ministry of Education, Anhui University of Technology, Maanshan 243002, China;2.China Academy of Space Technology, Beijing 100094, China

Fund Project:

Anhui Provincial Key Research and Development Program (202004b11020011); Natural Science Foundation of the Anhui Higher Education Institutions (KJ2021A0392)

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    摘要:

    電弧離子鍍技術(shù)已經(jīng)成為鍍膜技術(shù)中不可或缺的技術(shù)之一,并在金屬、裝飾、硬質(zhì)耐磨等領(lǐng)域被廣泛研究和應(yīng)用。膜層技術(shù)的研究應(yīng)用促使對電弧源技術(shù)的研究主要集中在長壽命、高可靠性和大顆粒抑制這幾方面,且后者的開展必須建立在前者的基礎(chǔ)上。大顆粒抑制的關(guān)鍵在于減少弧斑在靶面的駐留時間,可通過巧妙的永磁或電磁設(shè)計來實現(xiàn)具有較強橫向磁場分量的靶面,但當(dāng)磁場強度增大時,必須綜合考慮縱向磁場和橫向磁場的比例關(guān)系,考慮靶材本身的特點。另一種抑制大顆粒的方法是脈沖電弧技術(shù),脈沖電弧源引弧頻繁,在結(jié)構(gòu)設(shè)計上和恒流電弧源有很大的區(qū)別,瞬時電流能達(dá)到數(shù)千、甚至一萬安培以上,能夠獲得很高的沉積速率,同時陽極的設(shè)計使等離子體形成定向噴射,過濾掉大部分大顆粒。

    Abstract:

    Vacuum arc deposition has become one of the indispensable techniques in the coating field, and it is widely studied and applied in the metal, decoration, hard wear resistance, and other fields. The application research of coating techniques promotes the investigation on arc source technique, which mainly focuses on the fields of long life, high reliability, and macroparticle suppression. The realization of macroparticle suppression is based on the satisfaction of long life and high reliability. With reducing the residence time of arc spots on the target surface, the macroparticle suppression can be obtained. This result can be achieved by ingenious design of permanent magnet or electromagnetism, thereby obtaining a target surface with strong transverse magnetic component. However, when the magnetic field intensity increases, the internal characteristics of target and the proportional relationship between the longitudinal magnetic field and the transverse magnetic field should be comprehensively considered. Another macroparticle suppression method is the pulsed arc technique. The pulsed arc source frequently strikes the arc, which is very different from the direct current arc source in structure design. The instantaneous current can reach thousands, even more than ten thousands amperes, therefore obtaining a high deposition rate. At the same time, the anode design leads to the directional jet of plasma, which can filter out most large particles.

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引用本文

趙棟才,邱家新,邱家穩(wěn).電弧源自身大顆粒抑制技術(shù)研究進(jìn)展[J].稀有金屬材料與工程,2023,52(9):3076~3088.[Zhao Dongcai, Qiu Jiaxin, Qiu Jiawen. Review of Macroparticle Suppression Methods in Arc Source[J]. Rare Metal Materials and Engineering,2023,52(9):3076~3088.]
DOI:10.12442/j. issn.1002-185X.20230096

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  • 收稿日期:2023-02-28
  • 最后修改日期:2023-04-19
  • 錄用日期:2023-05-15
  • 在線發(fā)布日期: 2023-09-22
  • 出版日期: 2023-09-21