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晶粒尺寸對CVD純鎢在800℃下氧化行為的影響
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1.昆明理工大學(xué);2.北京理工大學(xué)

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昆明理工大學(xué)分析測試基金(項(xiàng)目號2019M20182230062)


Effect of grain size on the oxidation of CVD pure tungsten at 800℃
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1.Kunming University of Science and Technology;2.Beijing Institute of Technology

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    摘要:

    化學(xué)氣相沉積法（CVD）制備的金屬純鎢在不同表面存在較大的晶粒尺寸差異。從氧化膜層的成長規(guī)律、相組成及微觀結(jié)構(gòu)方面，研究了在干燥空氣、800℃下晶粒尺寸對CVD鎢高溫氧化行為的影響。結(jié)果表明：不同表面氧化膜層厚度的差異是由于細(xì)晶粒純鎢在氧化時(shí)能更快地形成氧化膜，促進(jìn)生成連續(xù)致密的氧化膜，提高了鎢的抗氧化性能，晶粒尺寸對鎢的氧化行為影響是正效應(yīng)。隨著細(xì)晶區(qū)的鎢全部被氧化，此時(shí)表面和頂面的晶粒尺寸相同，底面和頂面的氧化速率趨于一致，此外，沉積層的氧化速率由于邊緣效應(yīng)的影響而明顯增加。

    Abstract:

    The pure tungsten metal prepared by chemical vapor deposition (CVD) have distinct grain size on different surfaces. The high temperature oxidation experiment was carried out in dry air and at 800℃. The effect of grain size on CVD tungsten was studied from the growth curve, phase composition and microstructure of the oxide film. The results show that the fine grain tungsten can form oxide film more quickly during the oxidation process, promote the formation of continuous and compact oxide film, and improve the oxidation resistance of tungsten. The effect of grain size on the oxidation behavior of tungsten is positive. As the tungsten in the fine grain part oxidizes to the interior, the grain size of the surface and the top surface are the same, and the oxidation rate of the bottom and top surface tend to be the same. In addition, the oxidation rate of the deposition layer increases obviously due to the influence of the edge effect.

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張世輝,王開軍,胡勁,譚成文,于曉東,段云彪,張維均.晶粒尺寸對CVD純鎢在800℃下氧化行為的影響[J].稀有金屬材料與工程,2021,50(11):4073~4078.[Zhang Shihui, Wang Kaijun, Hu Jin, Tan Chengwen, Yu Xiaodong, Duan Yunbiao, Zhang Weijun. Effect of grain size on the oxidation of CVD pure tungsten at 800℃[J]. Rare Metal Materials and Engineering,2021,50(11):4073~4078.]
DOI：10.12442/j. issn.1002-185X.20200893

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  • 收稿日期:2020-11-19
  • 最后修改日期:2021-05-07
  • 錄用日期:2021-05-12
  • 在線發(fā)布日期: 2021-11-30
  • 出版日期: 2021-11-24