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不同磁控濺射工藝對納米晶TiN薄膜微觀結(jié)構(gòu)與力學(xué)性能的影響
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作者單位:

1.西安理工大學(xué) 材料科學(xué)與工程學(xué)院，陜西 西安 710048;2.廣東省科學(xué)院新材料研究所，廣東 廣州 510651

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基金項目:

51271144/51571114


Effects of Magnetron Sputtering Techniques on Microstruc-ture and Mechanical Properties of Nanocrystalline TiN Films
Author:
Affiliation:

1.School of Material Science and Engineering, Xi'an University of Technology, Xi'an 710048, China;2.Institute of New Materials, Guangdong Academy of Sciences, Guangzhou 510651, China

Fund Project:

National Natural Science Foundation of China (51271144, 51571114)

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    摘要:

    對比研究了直流磁控濺射（dcMS）、高功率脈沖磁控濺射（HPPMS）和調(diào)制脈沖磁控濺射（MPPMS）所沉積納米晶TiN薄膜的組織結(jié)構(gòu)與力學(xué)性能。結(jié)果表明，因dcMS濺射粒子離化率與動能均較低，薄膜表現(xiàn)為存在少量空洞的柱狀晶結(jié)構(gòu)，薄膜力學(xué)性能差、沉積速率為51 nm/min。HPPMS因具有較高的瞬時離化率和較低的占空比，薄膜結(jié)構(gòu)致密而光滑，性能得到了顯著改善，但平均沉積速率較低，僅為25 nm/min。通過MPPMS技術(shù)可大范圍調(diào)節(jié)峰值靶功率和占空比，從而得到較高的離化率和平均沉積速率，薄膜結(jié)構(gòu)致密光滑、力學(xué)性能優(yōu)異，沉積速率達(dá)45 nm/min，接近dcMS。

    Abstract:

    The structure and properties of nanocrystalline TiN films deposited by direct current magnetron sputtering (dcMS), high power pulsed magnetron sputtering (HPPMS) and modulated pulsed power magnetron sputtering (MPPMS) were compared. Results show that columnar structure with a few gaps is obtained through dcMS because of low ionization rate and low kinetic energy of sputtered species, which results in poor mechanical properties; the deposition rate is 51 nm/min. The TiN film deposited by HPPMS exhibits dense structure and smooth surface, which is because HPPMS can improve ionization rate of sputtered species under the conditions of high peak target power and low duty cycle. The mechanical properties are improved, but the average deposition rate is relatively low, only 25 nm/min. MPPMS has the capability to modulate peak target power and duty cycle to achieve high ionization degree and deposition rate. Thus, the TiN film deposited by MPPMS shows dense columnar structure, smooth surface, superior mechanical properties and enhanced deposition rate of 45 nm/min.

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郝娟,楊超,蔣百靈,杜玉洲,王戎,王旭,周克崧.不同磁控濺射工藝對納米晶TiN薄膜微觀結(jié)構(gòu)與力學(xué)性能的影響[J].稀有金屬材料與工程,2021,50(8):2715~2720.[Hao Juan, Yang Chao, Jiang Bailing, Du Yuzhou, Wang Rong, Wang Xu, Zhou Kesong. Effects of Magnetron Sputtering Techniques on Microstruc-ture and Mechanical Properties of Nanocrystalline TiN Films[J]. Rare Metal Materials and Engineering,2021,50(8):2715~2720.]
DOI：10.12442/j. issn.1002-185X.20200503

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  • 收稿日期:2020-07-13
  • 最后修改日期:2021-07-29
  • 錄用日期:2020-09-18
  • 在線發(fā)布日期: 2021-09-07
  • 出版日期: 2021-08-31