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脈沖電壓幅值與電解液流動狀態(tài)對無掩模定域性電沉積微鎳柱的影響
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大連大學

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國家自然科學基金資助(項目號51875071)


The Effect of Pulse Voltage Amplitude and Electrolyte Flow States on Manufacture of Micro Nickel Column by Mask-less Localized Electrochemical Deposition
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Dalian University

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    摘要:

    為探究脈沖電壓幅值與電解液流動狀態(tài)對無掩模定域性電沉積微鎳柱的影響,采用體視顯微鏡和SEM掃描電子顯微鏡對電沉積的微鎳柱進行觀察、檢測,并計算了平均沉積直徑和速率。在實驗的基礎(chǔ)上通過控制變量法研究了脈沖電壓幅值與電解液流動狀態(tài)對沉積微鎳柱平均直徑、平均沉積速率和表面形貌的影響。研究表明,脈沖電壓幅值越大,微鎳柱沉積速率越大,表面形貌越粗糙;平均沉積直徑和速率會隨電解液流動狀態(tài)變化而發(fā)生改變,沉積速率隨電解液流速的增加而加快;液滴、微液滴和微射流狀態(tài)下電壓的增大會導致微鎳柱沉積直徑增大,沖擊射流狀態(tài)下電壓的增大會導致微鎳柱直徑先增大后減小且微鎳柱頂部呈明顯的尖錐狀并在鎳柱周邊存在“毛刺”;微鎳柱的表面形貌隨電解液流動狀態(tài)的不同而不同,大流速噴射條件下,微鎳柱表面更平整、致密。

    Abstract:

    In order to explore the influence of different electrolyte flow states on mask-less localized electrodeposition, the nickel column was detected by stereoscopic microscopy and scanning electron microscopy, and the average deposition diameter and rate were calculated. On the basis of experiments, the effects of pulse voltage amplitude and electrolyte flow states on average deposition diameter, average deposition rate and surface morphology of micro nickel column were studied by means of control variable method. The research shows that the higher pulse voltage amplitude leads to the greater deposition rate and rougher surface of the micro-nickel column. the average deposition diameter and rate will change with the change of electrolyte flow states, and the deposition rate will increase with the increase of the flow rate of the electrolyte. The increase of the voltage in droplet, droplet and micro-jet will lead to the increase of the deposition diameter of the micro-nickel column. In the impinging jet state, the diameter of the micro-nickel column will first increase and then decrease with the increase of the voltage. At the same time, the tip of the nickel column is obviously tapered and there are "burrs" around the nickel column. The surface of nickel column varies with the velocity of each injection mode. The surface of nickel column is denser under the condition of high velocity injection.

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錢寧開,吳蒙華,賈衛(wèi)平,佐姍姍,王慧.脈沖電壓幅值與電解液流動狀態(tài)對無掩模定域性電沉積微鎳柱的影響[J].稀有金屬材料與工程,2021,50(3):918~923.[Qian Ningkai, Wu Menghua, Jia Weiping, Zuo Shanshan, Wang Hui. The Effect of Pulse Voltage Amplitude and Electrolyte Flow States on Manufacture of Micro Nickel Column by Mask-less Localized Electrochemical Deposition[J]. Rare Metal Materials and Engineering,2021,50(3):918~923.]
DOI:10.12442/j. issn.1002-185X.20200342

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  • 收稿日期:2020-05-19
  • 最后修改日期:2020-06-04
  • 錄用日期:2020-06-09
  • 在線發(fā)布日期: 2021-04-02
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