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鎂合金微弧氧化持續(xù)電弧對膜層的破壞機制
作者:
作者單位:

1.有色金屬先進加工與再利用國家重點實驗室;2.蘭州理工大學 材料學院

作者簡介:

通訊作者:

中圖分類號:

TG174

基金項目:

甘肅省創(chuàng)新基地和人才計劃-青年科技基金計劃資助(項目號17JR5RA112);


Destruction Mechanism of Sustained Arc on Magnesium Alloy Coated by MAO
Author:
Affiliation:

1.State Key Laboratory of Advanced Processing and Recycling of Non-ferrous Metals,Gansu Lanzhou;2.School of Materials,Lanzhou University of Technology

Fund Project:

Youth Science and Technology Fund Project of Gansu Province (China)(Project No. 17JR5RA112)

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    摘要:

    為了避免微弧氧化過程中的持續(xù)電弧放電對膜層的破壞,本文使用高速攝像機拍攝放電現象,結合負載的電流、電壓波形探究持續(xù)電弧放電的實質,并研究了被破壞區(qū)域的表面、截面形貌及相組成相對于正常膜層的變化,最后搭配不同的占空比和頻率,探索出電參數對持續(xù)電弧放電現象的影響規(guī)律。研究結果表明:在微弧氧化過程中,試樣表面呈現出燃弧—熄弧—冷卻的往復過程,而局部破壞區(qū)域則表現為連續(xù)的電弧放電現象。局部持續(xù)電弧放電區(qū)域的組分結構、表面形貌、截面形貌及元素分布均與正常微弧氧化膜層有很大差異,該膜層的均勻性、致密性和完整性均被破壞,導致膜層整體的均一性被破壞,甚至造成試樣的外形尺寸發(fā)生嚴重的破壞。負載的電容特性導致電弧持續(xù)時間過長而熔融金屬氧化物的冷卻時間不足,局部熱交換不充分和熱量集中,這是造成持續(xù)電弧破壞根本原因。該破壞發(fā)生后無法修復,因此可以通過對頻率和占空比的合理搭配,在不同的處理電壓下避免持續(xù)電弧破壞現象的發(fā)生。

    Abstract:

    In order to avoid the film were destructed by continuous arc discharge during micro-arc oxidation. This paper used a high-speed camera to capture the discharge phenomenon, combined with the current and voltage wave form of the load to explore the essence of continuous arc discharge. And investigated the destructed area of surface and cross-section morphology and the phase composition relative to the change of normal coating layer. Finally, different duty ratio and frequencies were used to explore the influence of the electrical parameters on the continuous arc discharge phenomenon. The results showed that the surface of the sample exhibits a reciprocating process of arc burning, arc quenching and cooling during micro-arc oxidation. The localized destructed area was characterized by a continuous arc discharge phenomenon. The composition, surface morphology, cross-section morphology and element distribution of the local continuous arc discharge region were very different from that of the normal micro-arc oxidation film layer. And the uniformity, compactness and integrity of the film layer was destroyed, which led to the destruction of the overall uniformity of the film layer, and even caused serious damage to the external size of the sample. The capacitance characteristic of the load caused the arc duration time to be too long while the cooling time of the molten metal oxide was insufficient, the local thermal transmission was insufficient and the heat was concentrated, which was the root cause of the continuous arc destructed. This destruction cannot be repaired after it occurs, so it is possible to avoid the occurrence of continuous arc destruction under different treatment voltages by reasonable matching of frequency and the duty ratio.

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引用本文

王 晟,馬 穎,宋承娣,李彬,郝 遠.鎂合金微弧氧化持續(xù)電弧對膜層的破壞機制[J].稀有金屬材料與工程,2020,49(6):1970~1976.[Wang Sheng, Ma Ying, Song Chengdi, Li Bin, Hao Yuan. Destruction Mechanism of Sustained Arc on Magnesium Alloy Coated by MAO[J]. Rare Metal Materials and Engineering,2020,49(6):1970~1976.]
DOI:10.12442/j. issn.1002-185X.20190992

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歷史
  • 收稿日期:2019-11-26
  • 最后修改日期:2020-01-02
  • 錄用日期:2020-01-03
  • 在線發(fā)布日期: 2020-07-09
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