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反應(yīng)磁控濺射(CrMoTaNbVTi)N多主元薄膜的微觀組織與機(jī)械性能研究
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蘭州空間技術(shù)物理研究所 真空技術(shù)與物理國(guó)防科技重點(diǎn)實(shí)驗(yàn)室

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Structure and mechanical properties of multi-element (CrMoTaNbVTi)N films by reactive magnetron sputtering
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Science and Technology on Vacuum Technology and Physical Laboratory,Lanzhou Institute of Physics

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    摘要:

    本文采用直流反應(yīng)磁控濺射方法，通過濺射（CrMoTaNbV）鑲嵌靶和純Ti靶制備了(CrMoTaNbVTi)N多主元氮化物薄膜。研究了不同氮?dú)饬髁勘萊N對(duì)(CrMoTaNbVTi)N薄膜的微觀結(jié)構(gòu)、力學(xué)性能和摩擦學(xué)性能的影響。結(jié)果表明，當(dāng)RN=0% 和10%時(shí)薄膜為簡(jiǎn)單的體心立方結(jié)構(gòu)，當(dāng)RN=20%、30% 和40%時(shí)為簡(jiǎn)單的面心立方結(jié)構(gòu)。隨著氮?dú)饬髁勘萊N的增大，表面顆粒逐漸減小，斷面柱狀晶更為致密，同時(shí)(CrMoTaNbVTi)N薄膜的殘余應(yīng)力、膜基結(jié)合力、硬度和彈性模量逐漸增大，且當(dāng)RN=40%時(shí)達(dá)到最大值，分別為-3.3 GPa, 352 mN, 25.6±1.2 GPa 和 278.8±11.2 GP。RN =40%制備的氮化物薄膜具有最小的比磨損率，相較合金薄膜降低了約1個(gè)數(shù)量級(jí)，表現(xiàn)出優(yōu)異的耐磨損性能。

    Abstract:

    In this study, (CrMoTaNbVTi)N multi-element films are deposited by direct current magnetron sputtering CrMoTaNbV mosaic alloy target and pure Ti target. The composition, structure, mechanical properties and wear behavior of the films deposited at RN (N2/(Ar+N2)=0%, 10%, 20%, 30% and 40% are investigated. The (CrMoTaNbVTi)N films deposited at RN=0% and 10 % exhibit a simple BCC solid solution structure, whereas those deposited at RN=20%, 30 % and 40% show a simple FCC solid solution structure. With increasing of RN, the size of the surface particles is decreased and the columnar crystals are become denser. Meanwhile, the compressive stress, adhesive critical load (Lc), hardness and elastic modules are increased and reach a maximum value of -3.3 GPa, 352 mN, 25.6±1.2 GPa and 278.8±11.2 GPa at RN=40%, respectively. The wear rate of film deposited at RN =40% is decreased about ten times that the alloy film (RN=0%), indicated an excellent wear resistance.

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馮興國(guó),鄭玉剛,張凱鋒,周暉,胡漢軍.反應(yīng)磁控濺射(CrMoTaNbVTi)N多主元薄膜的微觀組織與機(jī)械性能研究[J].稀有金屬材料與工程,2020,49(8):2623~2629.[Feng Xingguo, Zheng Yugang, Zhang Kaifeng, Zhou Hui, Hu Hanjun. Structure and mechanical properties of multi-element (CrMoTaNbVTi)N films by reactive magnetron sputtering[J]. Rare Metal Materials and Engineering,2020,49(8):2623~2629.]
DOI：10.12442/j. issn.1002-185X.20190449

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  • 收稿日期:2019-05-26
  • 最后修改日期:2019-08-04
  • 錄用日期:2019-08-21
  • 在線發(fā)布日期: 2020-09-27
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