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Electroformed gold layers were prepared by bidirectional pulse electrodeposition process, with thickness up to 150μm in 20h from cyanide-free bath. Through single variable experiment, which the pulse period was treated as a single variable, we studied the effect of pulse period on the properties of electroformed layer of gold using bidirectional pulse power. Scanning Electron Microscopy, X-ray Diffraction, and Vickers hardness test were used to research the surface mophology, average crystal size and hardness of electroformed gold layers. Results showed the microhardness of electroformed layer of gold is higher when pulse period changes between 45ms and 75ms, which can reach to 117HV0.1. Strong (111) preferred orientation can result in more flat micro surface and higher micohardness of electroformed gold layers.