2-Al2O3 (SAO) 雙金屬元素薄膜. 通過掃描電鏡(SEM)圖像,X射線衍射(XRD)圖譜,四探針測量,UV-IR及光致發(fā)光(PL)譜研究了襯底溫度對薄膜表面形貌,晶體微結(jié)構(gòu),電學(xué)及光學(xué)特性的影響. 當(dāng)襯底溫度增加時,SAO薄膜的晶粒尺寸增大. SEM圖像及XRD圖譜所顯示的均質(zhì)表面結(jié)構(gòu)及大晶粒尺寸表明薄膜具有良好的表面形貌和結(jié)晶度. 在400-800nm的可見光范圍,薄膜的透射率可達(dá)~80%-90%, 計(jì)算得到薄膜的帶隙約4.11-4.14eV, 表面電阻約7.0 -9.4 . 通過合理選擇濺射溫度, 薄膜的帶隙可得到增寬, 表面電阻可被降低. 測量還發(fā)現(xiàn)所制備SAO薄膜的PL譜在UV及紅光帶發(fā)光. 這種多晶SAO薄膜可用于透明導(dǎo)電氧化物(TCO)薄膜, 太陽能電池窗, 傳感器及光發(fā)射器."/>

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玻璃襯底溫度對濺射制備SnO2-Al2O3雙金屬元素薄膜電學(xué)及光學(xué)特性的影響研究
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西安文理學(xué)院 應(yīng)用物理研究所,,西安文理學(xué)院 應(yīng)用物理研究所,西安文理學(xué)院 應(yīng)用物理研究所,西安文理學(xué)院 應(yīng)用物理研究所,西安文理學(xué)院 應(yīng)用物理研究所,西安文理學(xué)院 應(yīng)用物理研究所,西安文理學(xué)院 應(yīng)用物理研究所

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Influence of substrate temperature on electrical and optical properties of sputtered binary SnO2-Al2O3 thin films on slide glasses
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Institute of Applied Physics,The Key Laboratory for Surface Engineering and Remanufacturing of Shaanxi,Xi’an University,Xi’an,School of Electronic Engineering,Xi’an University of Posts and Telecommunications,Xi’an,Institute of Applied Physics,The Key Laboratory for Surface Engineering and Remanufacturing of Shaanxi,Xi’an University,Xi’an,Institute of Applied Physics,The Key Laboratory for Surface Engineering and Remanufacturing of Shaanxi,Xi’an University,Xi’an,Institute of Applied Physics,The Key Laboratory for Surface Engineering and Remanufacturing of Shaanxi,Xi’an University,Xi’an,Institute of Applied Physics,The Key Laboratory for Surface Engineering and Remanufacturing of Shaanxi,Xi’an University,Xi’an,Institute of Applied Physics,The Key Laboratory for Surface Engineering and Remanufacturing of Shaanxi,Xi’an University,Xi’an,Institute of Applied Physics,The Key Laboratory for Surface Engineering and Remanufacturing of Shaanxi,Xi’an University,Xi’an

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    采用射頻(RF)磁控濺射法在玻璃襯底上制備了SnO2-Al2O3 (SAO) 雙金屬元素薄膜. 通過掃描電鏡(SEM)圖像,X射線衍射(XRD)圖譜,四探針測量,UV-IR及光致發(fā)光(PL)譜研究了襯底溫度對薄膜表面形貌,晶體微結(jié)構(gòu),電學(xué)及光學(xué)特性的影響. 當(dāng)襯底溫度增加時,SAO薄膜的晶粒尺寸增大. SEM圖像及XRD圖譜所顯示的均質(zhì)表面結(jié)構(gòu)及大晶粒尺寸表明薄膜具有良好的表面形貌和結(jié)晶度. 在400-800nm的可見光范圍,薄膜的透射率可達(dá)~80%-90%, 計(jì)算得到薄膜的帶隙約4.11-4.14eV, 表面電阻約7.0 -9.4 . 通過合理選擇濺射溫度, 薄膜的帶隙可得到增寬, 表面電阻可被降低. 測量還發(fā)現(xiàn)所制備SAO薄膜的PL譜在UV及紅光帶發(fā)光. 這種多晶SAO薄膜可用于透明導(dǎo)電氧化物(TCO)薄膜, 太陽能電池窗, 傳感器及光發(fā)射器.

    Abstract:

    SnO2-Al2O3 (SAO) binary thin films were prepared on slide glasses substrates by RF magnetron sputtering. The influence of the substrate temperature on the micrographs, crystal structures, electrical and optical properties were analyzed by using the scanning electron microscopy (SEM) images, X-ray diffraction (XRD) patterns, four-probe measuring, UV-IR and photoluminescence (PL) spectra. By increasing substrate temperature, the grain sizes of SAO binary films were enhanced, uniform patterns and large size grains indicate a better surface morphology and crystallinity of SAO films, which were verified by SEM and XRD investigations. All the films have a high average transmittivity of ~80%-90% in visible light region 400-800nm. The calculated band gap was in a range of ~4.11-4.14eV, and the measured sheet resistances of SAO films were in a range of ~7.0 to ~9.4 . By proper choosing sputtering temperature, the band gap can be widened, and the sheet resistances can be reduced. The PL emissions from the films in UV and red bands were also observed. These polycrystalline SAO films can be used in the application of transparent conductive oxide (TCO) films, solar cell windows, sensors, as well as lighter emitters.

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李院院,羅文峰,李姝麗,成楨,趙小俠,賀俊芳,張鵬飛,徐可為.玻璃襯底溫度對濺射制備SnO2-Al2O3雙金屬元素薄膜電學(xué)及光學(xué)特性的影響研究[J].稀有金屬材料與工程,2017,46(11):3217~3221.[Li Yuanyuan, Luo wenfeng, LI Shuli, Chen Zhen, Zhao Xiaoxia, He Junfang, Zhang Penfei, Xu Kewei. Influence of substrate temperature on electrical and optical properties of sputtered binary SnO2-Al2O3 thin films on slide glasses[J]. Rare Metal Materials and Engineering,2017,46(11):3217~3221.]
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  • 收稿日期:2016-12-07
  • 最后修改日期:2016-12-07
  • 錄用日期:2017-03-01
  • 在線發(fā)布日期: 2017-12-13
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