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氫化鋯表面KH570/A171改性硅溶膠膜層結(jié)構(gòu)及性能
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北京有色金屬研究總院,北京有色金屬研究總院,北京有色金屬研究總院,北京有色金屬研究總院,北京有色金屬研究總院,北京有色金屬研究總院

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TB34

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國家自然科學(xué)(51404034)


Structure and performance of KH570/A171 modified silica sol film on zirconium hydride surface
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General Research Institute for Nonferrous Metals,General Research Institute for Nonferrous Metals,General Research Institute for Nonferrous Metals,General Research Institute for Nonferrous Metals,General Research Institute for Nonferrous Metals,General Research Institute for Nonferrous Metals

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    摘要:

    以硅酸乙酯(TEOS)、γ-(甲基丙烯酰氧)丙基三甲氧基硅烷(硅烷偶聯(lián)劑KH570)和乙烯基三甲氧基硅烷(硅烷偶聯(lián)劑A171)等為主要原料制備硅烷偶聯(lián)劑KH570/A171改性硅溶膠,進而采用浸漬提拉法在氫化鋯表面制備溶膠膜層。紅外光譜(FTIR)分析顯示,硅烷偶聯(lián)劑能有效參與溶膠共聚反應(yīng)。透射電鏡(TEM)分析表明,硅烷偶聯(lián)劑的逐一加入有利于膠粒粒徑細(xì)化,提高和維持膠粒之間親和能力。掃描電鏡(SEM)分析顯示,使用硅烷偶聯(lián)劑KH570和A171改性的有機硅溶膠,可在氫化鋯表面制備干燥后無裂紋溶膠膜層,燒結(jié)溶膠膜層存在微裂紋而無明顯崩落;溶膠膜層表面元素分布均勻,燒結(jié)后存在碳?xì)堄?。真空熱放氫實驗表?氫化鋯表面燒結(jié)硅溶膠膜層的制備,起到了阻氫滲透的作用。600℃二氧化碳?xì)夥罩?燒結(jié)硅溶膠膜層具備阻礙氧滲透能力,對氫化鋯基體有抗高溫氧化作用。

    Abstract:

    Silane coupling agent modified silica sol was prepared with ethyl silicate (TEOS), 3-Methacryloxypropyltrimethoxysilane (silane coupling agent KH570) and vinyl trimethoxy silane (silane coupling agent A171) as main raw material, and then modified silica sol film on zirconium hydride was made by dip-coating method. FTIR analysis showed that coupling agent could participate in copolymerization reaction of the sol effectively. TEM analysis showed that it’s advantageous to refine colloidal particle size, improve and maintain the affinity between them as KH570 and A171 were added one by one into the sol. SEM analysis showed that dried crack-free sol film could be prepared on zirconium hydride substrate using KH570 and A171 modified silica sol. Micro cracks exist on the sintered sol film but without apparent flaking. Elements distribute evenly on the surface of the sol film in which residual carbon exists after sintering. Thermal hydrogen release experiment in vacuum demonstrated the preparation of sintered sol film on zirconium hydride could resistant hydrogen permeation. In CO2 atmosphere under 600℃, oxygen diffusion could also be hindered by the sintered silica sol film, which shows oxidation resistance for zirconium hydride substrate.

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吳明,陳洋,閆國慶,彭家慶,孫玉璞,王力軍.氫化鋯表面KH570/A171改性硅溶膠膜層結(jié)構(gòu)及性能[J].稀有金屬材料與工程,2018,47(2):630~635.[Wu Ming, Chen Yang, Yan Guoqing, Peng Jiaqing, Sun Yupu, Wang Lijun. Structure and performance of KH570/A171 modified silica sol film on zirconium hydride surface[J]. Rare Metal Materials and Engineering,2018,47(2):630~635.]
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  • 收稿日期:2016-01-07
  • 最后修改日期:2016-02-16
  • 錄用日期:2016-03-30
  • 在線發(fā)布日期: 2018-03-15
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