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C含量對電弧離子鍍TiAlCxN1-x(x=0, 0.18, 0.41, 0.49, 0.69)薄膜性能的影響
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陜西省教育廳產(chǎn)業(yè)化中試項目資助 (2011TG24)


Effect of C Content on Properties of TiAlCxN1-x (x=0, 0.18, 0.41, 0.49, 0.69) Films Deposited by Arc Ion Plating
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    摘要:

    在GCr15軸承鋼基體上, 利用多弧離子鍍技術(shù)低溫（175 ℃）沉積TiAlCN涂層。利用SEM、EPMA、XRD、附著力測試儀、納米壓痕儀和UMT-2 高溫摩擦磨損測試儀研究薄膜性質(zhì)。結(jié)果表明，涂層表面光滑平整、均勻致密且無明顯孔洞。涂層表面存在一定數(shù)量的液滴顆粒，薄膜厚度約為2 μm。在涂層中，發(fā)現(xiàn)了晶體結(jié)構(gòu)為fcc-TiN結(jié)構(gòu)，薄膜的晶粒大小為10~30 nm；隨著薄膜中C元素的加入，XRD譜中(Ti0.5,Al0.5)N峰出現(xiàn)了寬化；在TiAlN中引入C，附著力下降，隨著涂層中C含量的增加，薄膜中的Al和Ti比例未發(fā)生明顯變化，附著力略微增加，但硬度和彈性模量先增加后減小，摩擦系數(shù)一直減小

    Abstract:

    The composite TiAlCN films were deposited by vacuum arc ion plating on GCr15 rings at 175 oC. The properties of the films were characterized by SEM,?EPMA,?XRD,?adhesion?tester,?nano-hardness?tester and UMT-2 high temperature tribometer. The results indicate that the surface of the films is smooth and dense without any obvious pores. There are a certain number of droplets on the surface of films. The thickness of the films is about 2 μm. The fcc structure of TiN is found in the films. The grain size of the films is from 10 to 30 nm. With the addition of C element into the film, (Ti0.5,Al0.5)N peak in XRD patterns appears in width. After adding C into TiAlN, the adhesion of the films declines. However, the adhesion increases slightly along with the increase of the C content, but Al and Ti ratio does not change significantly. Besides, the hardness and elastic modulus increase first and then decreases, and the friction coefficient is always declined

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楊立軍,張澤輝,李 林,張 勇. C含量對電弧離子鍍TiAlCxN1-x(x=0, 0.18, 0.41, 0.49, 0.69)薄膜性能的影響[J].稀有金屬材料與工程,2015,44(6):1455~1458.[Yang Lijun, Zhang Zehui, Li Lin, Zhang Yong. Effect of C Content on Properties of TiAlCxN1-x (x=0, 0.18, 0.41, 0.49, 0.69) Films Deposited by Arc Ion Plating[J]. Rare Metal Materials and Engineering,2015,44(6):1455~1458.]
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  • 收稿日期:2014-06-12
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