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Si和UO2芯塊表面ZrB2薄膜的制備和表征
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Preparation and Characterization of ZrB2 Thin Films Deposited on Si and UO2 Fuel Element
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    摘要:

    ZrB2薄膜作為可燃中子毒物在反應(yīng)堆上得以應(yīng)用。本研究采用磁控濺射的方法在Si(111)和UO2芯塊表面制備了ZrB2薄膜。利用掃描電鏡（SEM）對薄膜的表面與截面形貌進(jìn)行了觀察，利用X射線衍射（XRD）儀、X射線能譜（EDS）、X射線光電子譜（XPS）對薄膜的物相及成分進(jìn)行了表征，采用熱循環(huán)以及劃痕法對膜層與基體的結(jié)合性能進(jìn)行考核。結(jié)果表明，所制備的薄膜為ZrB2薄膜且膜層較為純凈，基本只含有Zr和B 2種元素；ZrB2膜層和UO2基體結(jié)合性能良好，膜層生長致密均勻；膜層破壞的臨界載荷約為455 mN。

    Abstract:

    ZrB2 thin films are used as neutron burnable absorbers of nuclear reactor. In this paper, ZrB2 thin films were prepared on surfaces of Si(111) and UO2 fuel elements by magnetron sputtering. The microstructures of films were observed with scanning electron microscope (SEM). The phase constituents and compositions of ZrB2 films were analyzed by X-ray diffraction (XRD), X-ray energy dispersion spectroscope (EDS) and X-ray Photoelectron Spectroscopy (XPS). This paper has focused its efforts on the adherence quality through thermal shock and nano scratch tests. Results show that films with dense growth deposited on Si(111) and UO2 substrates are uniform and well adhered to the substrates. The films are consisted of pure ZrB2, and only Zr and B elements are detected. The critical load of films is about 455 mN.

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劉朋闖,劉婷婷,龐曉軒,王慶富,張鵬程,王志剛. Si和UO2芯塊表面ZrB2薄膜的制備和表征[J].稀有金屬材料與工程,2015,44(3):723~726.[Liu Pengchuang, Liu Tingting, Pang Xiaoxuan, Wang Qingfu, Zhang Pengcheng, Wang Zhigang. Preparation and Characterization of ZrB2 Thin Films Deposited on Si and UO2 Fuel Element[J]. Rare Metal Materials and Engineering,2015,44(3):723~726.]
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  • 收稿日期:2014-03-20
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  • 在線發(fā)布日期: 2015-05-29
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