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水楊酸體系拋光液中釕的化學(xué)機(jī)械拋光研究
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國家自然科學(xué)基金項目（50975002）；安徽工業(yè)大學(xué)創(chuàng)新團(tuán)隊項目（TD201204）；教育部高校留學(xué)回國人員科研項目


Chemical Mechanical Polishing of Ruthenium in Salicylic Acid System Slurry
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    摘要:

    研究了拋光液中H2O2和水楊酸濃度對釕的拋光速率的影響。采用電化學(xué)方法和X射線光電子能譜分析了H2O2和水楊酸對金屬釕腐蝕效果的影響；采用原子力顯微鏡觀察釕表面的微觀形貌。結(jié)果表明：水楊酸濃度的增加有利于金屬釕表面鈍化膜的形成，拋光速率值隨之增加；隨著H2O2濃度的不斷增加，拋光速率不斷增加，當(dāng)H2O2質(zhì)量分?jǐn)?shù)大于3%時，拋光速率值隨濃度的增加而降低。拋光后的金屬釕表面平均粗糙度Ra為7.2 nm。

    Abstract:

    The effect of concentrations of hydrogen peroxide (H2O2) and salicylic acid (SA) on the material removal rate (MRR) in slurries was investigated. The influence of H2O2 and SA on the corrosion behavior was studied by electrochemical methods and X-ray photoelectron spectroscopy (XPS). The surface roughness of the polished Ru disk was characterized by atomic force microscopy (AFM). The results show that the increase of SA promotes formation of passive film, and increases the MRR of Ru. MRR increases with the increasing of H2O2 at the beginning, but it would decrease when the concentration of H2O2 is higher than 3%. The surface roughness Ra of the polished Ru surface could reach 7.2 nm.

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王 婕,儲向峰,董永平,白林山,葉明富,孫文起.水楊酸體系拋光液中釕的化學(xué)機(jī)械拋光研究[J].稀有金屬材料與工程,2014,43(12):3120~3123.[Wang Jie, Chu Xiangfeng, Dong Yongping, Bai Linshan, Ye Mingfu, Sun Wenqi. Chemical Mechanical Polishing of Ruthenium in Salicylic Acid System Slurry[J]. Rare Metal Materials and Engineering,2014,43(12):3120~3123.]
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  • 收稿日期:2013-12-17
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  • 在線發(fā)布日期: 2015-04-16
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