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Effect of Methane Flow Rate on Growth and Properties of TiSi-C:H Films Deposited by Middle-frequency Magnetron Sputtering
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Effect of Methane Flow Rate on Growth and Properties of TiSi-C:H Films Deposited by Middle-frequency Magnetron Sputtering
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National Natural Science Foundation of China (51105186); Natural Science Foundation of Gansu Province (1014RJZA007); Excellent Young Teachers Program of Lanzhou University of Technology (1010ZCX010); the Doctoral Research Grant of Lanzhou University of Technology

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    摘要:

    以甲烷為先驅(qū)氣體通過中頻磁控濺射Ti80Si20靶材在硅和不銹鋼基底上制備TiSi-C:H薄膜,研究了甲烷流量對(duì)薄膜沉積速率、結(jié)構(gòu)、力學(xué)和摩擦學(xué)性能的影響。結(jié)果表明, 甲烷流量對(duì)薄膜結(jié)構(gòu)、力學(xué)和摩擦學(xué)性能有顯著影響,隨甲烷流量增加薄膜從包含約10 nm晶的錐狀納米晶/非晶復(fù)合結(jié)構(gòu)向非晶結(jié)構(gòu)轉(zhuǎn)變,在低甲烷流量下沉積的薄膜具有高硬度、高應(yīng)力和高磨損率;在高甲烷流量下薄膜硬度和應(yīng)力降低,而摩擦學(xué)性能提高。薄膜力學(xué)和摩擦學(xué)性能的變化被認(rèn)為是隨甲烷流量增加薄膜結(jié)構(gòu)演化的結(jié)果。

    Abstract:

    The TiSi-C:H films were deposited on the silicon and the stainless steel substrates by middle-frequency magnetron sputtering Ti80Si20 targets using the methane gas as the precursor. The effects of the methane flow rate on the deposition rate, the structure, the mechanical and tribological properties were investigated. The results demonstrate that the structure, the mechanical and tribological properties of the films strongly depend on the methane flow rate. The deposited films exhibit a transition from a tapered columnar nanocomposite structure consisting of ~10 nm nanocrystallites and amorphous phases to an amorphous structure with increasing of methane flow rate. The films deposited at a low methane flow rate show high hardness, high internal stress and high wear rates, whereas the films deposited at high methane flow rate show a decrease in hardness and internal stress but an improvement in tribological performance. The variations on the mechanical and tribological properties may be attributed to the evolution of the microstructures of the films with increasing of methane flow rate.

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姜金龍,陳 娣,王 瓊,黃 浩,朱維君,郝俊英. Effect of Methane Flow Rate on Growth and Properties of TiSi-C:H Films Deposited by Middle-frequency Magnetron Sputtering[J].稀有金屬材料與工程,2014,43(10):2305~2310.[Jiang Jinlong, Chen Di, Wang Qiong, Huang Hao, Zhu Weijun, Hao Junying. Effect of Methane Flow Rate on Growth and Properties of TiSi-C:H Films Deposited by Middle-frequency Magnetron Sputtering[J]. Rare Metal Materials and Engineering,2014,43(10):2305~2310.]
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  • 收稿日期:2013-11-14
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  • 在線發(fā)布日期: 2015-04-07
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