最新色国产精品精品视频,中文字幕日韩一区二区不卡,亚洲有码转帖,夜夜躁日日躁狠狠久久av,中国凸偷窥xxxx自由视频

+高級檢索
CSD-La3TaO7薄膜外延生長行為研究
DOI:
作者:
作者單位:

西北有色金屬研究院,西北有色金屬研究院,西北有色金屬研究院,西北有色金屬研究院,西北有色金屬研究院,西北有色金屬研究院,西北有色金屬研究院

作者簡介:

通訊作者:

中圖分類號:

基金項(xiàng)目:

國家自然科學(xué)基金項(xiàng)目(面上項(xiàng)目,重點(diǎn)項(xiàng)目,重大項(xiàng)目)


The study of epitaxial growth behavior of CSD-La3TaO7
Author:
Affiliation:

Northwest Institute for Nonferrous Metal Research,Northwest Institute for Nonferrous Metal Research,Northwest Institute for Nonferrous Metal Research,Northwest Institute for Nonferrous Metal Research,Northwest Institute for Nonferrous Metal Research,Northwest Institute for Nonferrous Metal Research,Northwest Institute for Nonferrous Metal Research

Fund Project:

The National Natural Science Foundation of China (61271156); Innovation Team Project of AHUT (TD201204); the Research Project for University Personnel Returning from Overseas Sponsored by the Ministry of Education of China

  • 摘要
  • |
  • 圖/表
  • |
  • 訪問統(tǒng)計(jì)
  • |
  • 參考文獻(xiàn)
  • |
  • 相似文獻(xiàn)
  • |
  • 引證文獻(xiàn)
  • |
  • 資源附件
  • |
  • 文章評論
    摘要:

    涂層導(dǎo)體是實(shí)現(xiàn)氧化物高溫超導(dǎo)材料在液氮溫區(qū)強(qiáng)磁場應(yīng)用的關(guān)鍵材料。在低成本的軋制輔助雙軸織構(gòu)/化學(xué)溶液沉積(RABiTS/CSD)路線中,緩沖層的良好外延生長是實(shí)現(xiàn)超導(dǎo)層織構(gòu)生長以及高載流能力的前提,因此研究緩沖層外延生長行為就顯得非常必要。本文探索了CSD技術(shù)制備La3TaO7(LTO)緩沖層過程中前驅(qū)液的熱分解行為以及熱處理工藝路線對薄膜取向生長的影響,通過選取恰當(dāng)?shù)腖TO前驅(qū)液以及快速熱處理升溫的方法最終獲得了良好c軸織構(gòu)的LTO薄膜。

    Abstract:

    Coated conductors become the significant materials that provide the potential to support high current for electric utility and high magnetic field applications at 77 K. In RABiTS/CSD routs with low-cost, the epitaxial growth of buffer layer on textured metallic substrate is an essential precondition for the biaxial texture growth of superconducting layer and its high current carrying capacity. Therefore, the study of the epitaxial growth behavior of buffer layer becomes important. In this paper, we have explored the influence of the thermal decomposition behavior of LTO-gels and the heat-treatment process route on the texture and morphology evolution of buffer layer. LTO buffer layer with good c-axis texture and smooth surface could be obtained by choosing the suitable LTO precursor solution and adjusting a rapid elevated temperature processing methods.

    參考文獻(xiàn)
    相似文獻(xiàn)
    引證文獻(xiàn)
引用本文

王耀,李成山,于澤銘,馮建情,金利華,王輝,張平祥. CSD-La3TaO7薄膜外延生長行為研究[J].稀有金屬材料與工程,2016,45(7):1832~1835.[wangyao, lichengshan, yuzeming, fengjianqing, jinlihua, wanghui, zhangpingxiang. The study of epitaxial growth behavior of CSD-La3TaO7[J]. Rare Metal Materials and Engineering,2016,45(7):1832~1835.]
DOI:[doi]

復(fù)制
文章指標(biāo)
  • 點(diǎn)擊次數(shù):
  • 下載次數(shù):
  • HTML閱讀次數(shù):
  • 引用次數(shù):
歷史
  • 收稿日期:2014-05-30
  • 最后修改日期:2014-07-14
  • 錄用日期:2014-08-12
  • 在線發(fā)布日期: 2016-10-09
  • 出版日期: