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Study of Ta-doped CeO2 Buffer Layer for Coated Conductors
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Study of Ta-doped CeO2 Buffer Layer for Coated Conductors
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    摘要:

    采用簡單的金屬有機(jī)物沉積方法在自制的Ni-5W基帶上成功地制備了Ta摻雜CeO2過渡層。XPS結(jié)果表明:在熱處理時(shí)的還原性氣氛中,Ta5+優(yōu)先于Ce4+被還原為Ta4+,這有利于減少或抑制由于Ce4+被還原而產(chǎn)生的裂紋和孔洞。XRD結(jié)果表明除CeO2的衍射峰稍變小外,沒有發(fā)現(xiàn)新的物相生成,這說明Ta4+部分取代了CeO2晶格中Ce4+的位置生成了Ce0.75Ta0.25O2. Ce0.75Ta0.25O2 的ω-掃描和j-掃描半高寬帶分別是 4.38o和 6.67o,這表明Ce0.75Ta0.25O2具有良好的面外和面內(nèi)織構(gòu)。AES結(jié)果表明單層Ce0.75Ta0.25O2的厚度大約為70 nm,在過渡層的表面沒有檢測到Ni元素,說明該過渡層具有很好的阻止元素?cái)U(kuò)散的能力。綜上說明,Ta摻雜的CeO2過渡層有望成為涂層導(dǎo)體用單層多功能過渡層。

    Abstract:

    Ta-doped CeO2 buffer layers were grown on the home-made textured Ni-5W substrates for YBCO coated conductors by a simple metal-organic deposition technique. The characterization of the samples was discussed. XPS results indicate that Ta5+ is reduced into Ta4+ prior to Ce4+, which is helpful to suppress the formation of holes and cracks in CeO2 films from reducing Ce4+ into Ce3+. Additionally, no new phase is found by doping Ta into CeO2, which indicates that Ta4+ replaces the Ce4+ position in CeO2 lattice to form Ce0.75Ta0.25O2. The Ce0.75Ta0.25O2 has a good out-of-plane and in-plane texture FWHM values for ω scan and j scan are 4.38o and 6.67o, respectively. AES measurements show that no Ni element is detected on the surface of Ce0.75Ta0.25O2 film, and a one-layer film has a thickness of about 70 nm. It is promising that the presently developed Ce0.75Ta0.25O2 film can be used as a single multi-functional buffer layer for coated conductor.

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劉 敏,呂 昭,徐 燕,葉 帥,索紅莉. Study of Ta-doped CeO2 Buffer Layer for Coated Conductors[J].稀有金屬材料與工程,2014,43(6):1329~1331.[Liu Min, Lü Zhao, Xu Yan, Ye Shuai, Suo Hongli. Study of Ta-doped CeO2 Buffer Layer for Coated Conductors[J]. Rare Metal Materials and Engineering,2014,43(6):1329~1331.]
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  • 收稿日期:2013-06-15
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  • 在線發(fā)布日期: 2014-11-13
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