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高純W-Si合金粉的研制
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Preparation of High Purity W-Si Alloy Powder
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    摘要:

    以高純W粉、Si粉為原料，在真空環(huán)境下進(jìn)行高溫預(yù)合金化處理，制備了高純W-Si合金粉。通過優(yōu)化, 確定了最佳預(yù)合金化溫度為1000 ℃；合金粉中，單質(zhì)W相消失，生成WSi2相。粉末粒度呈單峰分布, d50為21.037 μm，d90為50.905 μm，純度可達(dá)到99.995%以上。采用合金粉燒結(jié)的磁控濺射靶材的微觀組織、成分均勻分布，解決了W-Si靶材成分難以均勻的難題

    Abstract:

    In order to prepare high purity tungsten silicide (W-Si) alloy powder, high purity W powder and Si powder as starting materials were pre-alloyed in high temperature and vacuum environment. The pre-alloying temperature was 800, 1000 and 1200 oC, and the optimized temperature was 1000 oC. Through the pre-alloying of 1000 oC, the W phase disappeared and the WSi2 phase formed in the powder. The powder particles present single peak distribution and the particle size of d50 is 21.037 μm, and d90 is 50.905 μm. And the powder purity could reach more than 99.995%. Using the pre-alloying tungsten silicide powder as material, the magnetron sputtering target was sintered with a uniform microstructure and alloy composition, which solve the problem of non-uniform microstructure and alloy composition of tungsten silicide target

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丁照崇,陳 明,劉書芹,王欣平,呂保國.高純W-Si合金粉的研制[J].稀有金屬材料與工程,2014,43(5):1269~1271.[Ding Zhaochong, Chen Ming, Liu Shuqin, Wang Xinping, Lü Baoguo. Preparation of High Purity W-Si Alloy Powder[J]. Rare Metal Materials and Engineering,2014,43(5):1269~1271.]
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  • 收稿日期:2013-05-13
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  • 在線發(fā)布日期: 2014-10-13
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