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哈氏C-2000合金在等溫氧化時第二相沉淀析出行為
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西北工業(yè)大學 凝固技術國家重點實驗室

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Precipitation behavior of second phases during isothermal oxidation of Hastelloy C-2000 alloys
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State Key Laboratory of Solidification Processing, Northwestern Polytechnical University

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    摘要:

    研究了哈氏C2000合金在800℃100h空氣中等溫氧化后合金基體中第二相的沉淀行為。氧化后基體中析出了富Mo相,可確定該富Mo相為具有金剛石結(jié)構的Mo3Ni3C型碳化物。富Mo相沿晶界和晶內(nèi)分別呈現(xiàn)出非連續(xù)和連續(xù)條狀形貌特征。然而,經(jīng)深腐蝕后,晶內(nèi)和晶界處形貌均發(fā)生了變化,即,沿晶界出現(xiàn)了大量白色絮狀物,晶內(nèi)則出現(xiàn)了具有金剛石結(jié)構的腐蝕坑。由于富Ni和富Cr區(qū)域具有更負的電極電位,因而使得這些區(qū)域在深腐蝕后更易被侵蝕。

    Abstract:

    The precipitation behavior of second phases in Hastelloy C-2000 alloy matrix was studied after isothermal oxidation at 800 oC for 100 h in air. Mo-rich phases were precipitated in the alloy matrix after oxidation. It is determined that Mo-rich phases with diamond cubic structure are Mo3Ni3C type carbides. Morphology characteristics of Mo-rich phases with both no-continuous irregular strip and continuous were presented along grain boundaries and in matrix, respectively. However, some variation of morphologies will take place at both grain and grain boundaries after deep etching, i.e., a large number of white flocculent structure were distributed along grain boundaries, and corrosion pits with a diamond structure appear in intragranular. Areas of Ni and Cr-rich are more easily corroded during deep etching due to a more negative electrode potential in areas.

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袁亮.哈氏C-2000合金在等溫氧化時第二相沉淀析出行為[J].稀有金屬材料與工程,2016,45(1):28~31.[yuanliang. Precipitation behavior of second phases during isothermal oxidation of Hastelloy C-2000 alloys[J]. Rare Metal Materials and Engineering,2016,45(1):28~31.]
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  • 收稿日期:2013-12-24
  • 最后修改日期:2014-03-03
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  • 在線發(fā)布日期: 2019-01-04
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