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Study?on?Vanadium?Films?Deposited?on?Concave?Object?by?Conventional?Direct?Current?and?High?Power?Pulsed?Magnetron?Sputtering
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Study?on?Vanadium?Films?Deposited?on?Concave?Object?by?Conventional?Direct?Current?and?High?Power?Pulsed?Magnetron?Sputtering
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National Natural Science Foundation of China (51175118); Project supported by the open foundation of Science and Technology on Surface Physics and Chemistry Laboratory (SPC201104)

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    摘要:

    高功率脈沖磁控濺射是一種制備高質(zhì)量薄膜的新興方法。在相同的平均功率下分別采用HPPMS技術(shù)和傳統(tǒng)DCMS技術(shù)在凹槽工件表面制備了釩薄膜。對比研究了兩種方法下的等離子體組成、薄膜的晶體結(jié)構(gòu)、表面形貌及膜層厚度的異同。結(jié)果表明：HPPMS產(chǎn)生的等離子體包括Ar(1+)，V(0)和相當數(shù)量的V(1+)；而DCMS放電時的等離子體包括Ar(1+)，V(0)和極少量的V(1+)。兩種方法制備的凹槽不同位置處釩薄膜相結(jié)構(gòu)的變化規(guī)律大致相似。HPPMS制備的釩薄膜表面致密、平整；而DCMS制備的膜層表面出現(xiàn)非常銳利的尖峰且高度很高，凹槽不同位置表面狀態(tài)表現(xiàn)出較大差異。DCMS制備的釩薄膜截面表現(xiàn)為疏松的柱狀晶結(jié)構(gòu)；而HPPMS制備的膜層也具有輕微的柱狀晶結(jié)構(gòu)，但結(jié)構(gòu)更為致密。HPPMS時的膜層厚度小于DCMS時的膜層厚度。與凹槽工件的上表面相比，DCMS時側(cè)壁膜層的厚度為上表面的32%，底部膜層的厚度為上表面的55%。而HPPMS時側(cè)壁的厚度為上表面的35%，底部膜層的厚度為上表面的69%。采用HPPMS方法在凹槽工件表面獲得的膜層厚度整體上表現(xiàn)出更好的均勻性

    Abstract:

    High power pulsed magnetron sputtering (HPPMS) is a novel tool to fabricate films with high quality. In this paper, vanadium films on concave object have been deposited by HPPMS and conventional direct current magnetron sputtering (DCMS) under the condition of the same average power. The plasma composition, crystalline structure, surface morphology and film thickness have been investigated. The results show that the plasma produced by HPPMS is composed of Ar(1+), V(0) and a certain amount of V(1+). In contrast, the plasma produced by DCMS is composed of Ar(1+), V(0) and a very small amount of V(1+). Both films fabricated by HPPMS and DCMS demonstrate the similar microstructures. The HPPMS vanadium films are dense and flat on the top surface while the surface of DCMS vanadium films presents very sharp peak with larger height. The DCMS vanadium films exhibit a porous columnar grain structure. In contrast, the HPPMS vanadium films have slightly columnar and denser structure. The thickness of the HPPMS vanadium films is less than that of DCMS vanadium films. Compared with the surface on the top, the thickness of the DCMS vanadium films is decreased to about 32% at the side wall and to about 55% at the bottom. However, the HPPMS vanadium films can reach a thickness of about 35% at the side wall and 69% at the bottom relative to that on the top surface. HPPMS shows a better uniformity in the film thickness on concave object

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李春偉,田修波,劉天偉,秦建偉,楊晶晶,鞏春志,楊士勤. Study?on?Vanadium?Films?Deposited?on?Concave?Object?by?Conventional?Direct?Current?and?High?Power?Pulsed?Magnetron?Sputtering[J].稀有金屬材料與工程,2013,42(12):2437~2441.[Li Chunwei, Tian Xiubo, Liu Tianwei, Qin Jianwei, Yang Jingjing, Gong Chunzhi, Yang Shiqin. Study?on?Vanadium?Films?Deposited?on?Concave?Object?by?Conventional?Direct?Current?and?High?Power?Pulsed?Magnetron?Sputtering[J]. Rare Metal Materials and Engineering,2013,42(12):2437~2441.]
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  • 收稿日期:2012-12-20
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