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Preparation of Nano-SnO2 Abrasives and Their Application in Chemical Mechanical Polish of Ruthenium
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Preparation of Nano-SnO2 Abrasives and Their Application in Chemical Mechanical Polish of Ruthenium
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National Natural Science Foundation of China (50975002); Innovation Team Project of AHUT (TD201204); The Research Project for University Personnel Returning from Overseas Sponsored by the Ministry of Education of China

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    摘要:

    利用固相反應(yīng)法制備納米二氧化錫磨料并研究了制備條件對(duì)平均粒徑的影響。結(jié)果表明，在500 ℃/4 h條件下制得的納米二氧化錫粉體在水中有良好的分散性和穩(wěn)定性。利用自制的拋光液對(duì)高純釕片進(jìn)行化學(xué)機(jī)械拋光，與二氧化硅磨料拋光液比較，材料去除速率和表面粗糙度都降低。當(dāng)拋光液中含1%（質(zhì)量分?jǐn)?shù)，下同）二氧化錫、1%過(guò)硫酸銨、1%酒石酸和3 mmol/L咪唑，pH=8.0，拋光壓力為17.24 kPa時(shí)，材料去除速率（MRR）和表面粗糙度(Ra)分別為6.8 nm/min和4.8 nm。

    Abstract:

    SnO2 abrasives were prepared by solid-state reaction and the effect of the preparation conditions on the average particle size of SnO2 suspension was investigated. The result manifests that the suspension prepared from SnO2 powder obtained by calcining at 500 °C for 4 h has good dispersion and good stability. CMP (chemical mechanical polish) experiments were performed on high purity Ru by home-made slurry. The MRR (material removed rate) and the roughness of the surface decrease compared with SiO2 slurry. The results reveal that MRR can reach 6.8 nm/min under the following conditions: the main constituents in slurry are 1 wt% SnO2, 1 wt% (NH4)2S2O8, 1 wt% tartaric acid and 3 mmol/L imidazole, the pH value is 8.0, the down force is 17.24 kPa; the roughness Ra is 4.8 nm under these conditions.

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儲(chǔ)向峰,李秀金,董永平,喬紅斌,白林山. Preparation of Nano-SnO2 Abrasives and Their Application in Chemical Mechanical Polish of Ruthenium[J].稀有金屬材料與工程,2013,42(4):692~695.[Chu Xiangfeng, Li Xiujin, Dong Yongping, Qiao Hongbin, Bai Linshan. Preparation of Nano-SnO2 Abrasives and Their Application in Chemical Mechanical Polish of Ruthenium[J]. Rare Metal Materials and Engineering,2013,42(4):692~695.]
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  • 收稿日期:2012-04-27
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