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The principle and method of chemical vapor deposition tantalum were proposed. Through the cold wall deposition, tantalum coatings were deposited on molybdenum substrates. The effect of CVD temperature on deposition rate, microstructure and hardness of Ta coatings was investigated. The results show that with the increasing of the deposition temperature, the deposition rate increases in the range of 1000~1200 °C; above 1200 °C, the deposition rate decreases; the microstructure of the deposition layer is of columnar grain and the grain size increases with the increasing of the deposition temperature. Meanwhile the hardness and density of the deposition layer decreases. The optimal deposition temperature of CVD tantalum layer is about 1100 °C.