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低溫熔鹽中電沉積制備La-Mg-Ni三元合金膜及其性能研究
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遼寧省教育廳科學(xué)研究項(xiàng)目計(jì)劃(20060616)


Electrodeposition of La-Mg-Ni Alloy Film in Low Temperature Melted Salt and Its Performance
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    摘要:

    采用恒電位法在乙酰胺-尿素-NaBr-KBr熔體中電沉積出La-Mg-Ni三元合金膜。用掃描電鏡(SEM)、X射線(xiàn)衍射(XRD)等方法研究了沉積層的表面形貌和結(jié)構(gòu),用Tafel極化曲線(xiàn)和交流阻抗(EIS)方法研究了合金薄膜的電化學(xué)性能。結(jié)果表明,隨著陰極電位負(fù)移的增大,表面更平整,儲(chǔ)氫性能更好。當(dāng)沉積電位為–1.0 V時(shí),沉積層表面的表觀活化自由能最小(△G≠=22.35 kJ·mol-1),說(shuō)明具有很高的析氫活性。在EIS中的吸附程度Q為7.98 μF·cm-2,表明具有很高的儲(chǔ)氫能力。

    Abstract:

    The La-Mg-Ni alloy films were prepared by a constant-voltage electrodeposition method in acetamide-urea-NaBr-KBr. The surface morphology and structure of the films were studied by SEM and XRD. The electrochemical performance was studied by Tafel and EIS. The results show that the film has smoother surface and better hydrogen storage function with the cathode potential shifting to negative direction. △G≠ and Q of the deposition layer are determined to be 22.35 kJ·mol-1 and 7.98 μF/cm2, respectively when the voltage is –1.0 V, indicating the high hydrogen evolution activity and high hydrogen capacity.

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李正元,于 錦,王麗麗.低溫熔鹽中電沉積制備La-Mg-Ni三元合金膜及其性能研究[J].稀有金屬材料與工程,2012,41(11):2029~2032.[Li Zhengyuan, Yu Jin, Wang Lili. Electrodeposition of La-Mg-Ni Alloy Film in Low Temperature Melted Salt and Its Performance[J]. Rare Metal Materials and Engineering,2012,41(11):2029~2032.]
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  • 收稿日期:2011-11-06
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