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AZ31鎂合金在化學(xué)鍍鍍液中的電化學(xué)行為研究
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江蘇高校優(yōu)勢學(xué)科建設(shè)工程資助項(xiàng)目


Electrochemical Behavior of AZ31 Wrought Magnesium Alloy in the Solution
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    摘要:

    采用混合電位-時(shí)間曲線、極化曲線和電化學(xué)阻抗譜,研究經(jīng)不同濃度氫氟酸活化處理后的AZ31變形鎂合金在化學(xué)鍍鍍液中的電化學(xué)行為,并通過掃描電子顯微鏡(SEM)觀察AZ31活化前后的形貌變化。結(jié)果表明,經(jīng)活化的試樣在化學(xué)鍍過程中被鍍層完全覆蓋,所用時(shí)間隨著氫氟酸濃度的增加而延長;鍍液中的鎳離子被還原的起始電位隨著氫氟酸濃度的增加而向正偏移;電極/鍍液界面反應(yīng)的電荷轉(zhuǎn)移電阻隨著氫氟酸濃度的增加而增大,并且電極/鍍液界面反應(yīng)是化學(xué)鍍初始沉積期的控制步驟;AZ31鎂合金基體中的Mn-Al相在氫氟酸活化過程中的顆粒脫落是導(dǎo)致氟化膜產(chǎn)生缺陷的主要原因,氫氟酸濃度越高,氟化膜缺陷越少。

    Abstract:

    Electrochemical behavior of AZ31 wrought magnesium alloy activated by hydrofluoric acid (HF) of different concentration was studied in an electroless nickel plating bath, using mixed potential-time curves, polarization curves and electrochemical impedance spectrum. Changes of morphologies of AZ31 samples before and after the HF activation were observed by scanning electron microscopy (SEM). The results show that the time in which the activated samples were coated completely by Ni-P layers extends with the increase of the concentration of HF. The onset reduction potential of Ni2+ in the plating bath shifts toward positive direction with an increase in the concentration of HF. The charge transfer resistance of electrode/bath interface reaction increases with an increase in the concentration of HF, and the interface reaction between the electrode and the bath is the rate-controlling step during the initial deposition stage. The shedding of Mn-Al particles in the AZ31 magnesium alloy matrix during the HF activation process results in the defect formation of the fluoride film, and the higher concentration of HF, the less defect formed on the fluoride film.

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秦鐵男,馬立群,姚 妍,解 瑞,丁 毅. AZ31鎂合金在化學(xué)鍍鍍液中的電化學(xué)行為研究[J].稀有金屬材料與工程,2012,41(9):1586~1591.[Qin Tienan, Ma Liqun, Yao Yan, Xie Rui, Ding Yi. Electrochemical Behavior of AZ31 Wrought Magnesium Alloy in the Solution[J]. Rare Metal Materials and Engineering,2012,41(9):1586~1591.]
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  • 收稿日期:2011-09-10
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