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EB-PVD制備TiAl/NiCoCrAl微層板復(fù)合材料氧化性能研究
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特種環(huán)境復(fù)合材料技術(shù)國(guó)防科技重點(diǎn)實(shí)驗(yàn)室開放基金資助（HIT. KLOF. 2009027）和黑龍江省自然科學(xué)基金項(xiàng)目（E201027）


Study on Oxidation Property of TiAl/NiCoCrAl Microlaminated Sheet Prepared by EB-PVD
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    摘要:

    采用電子束物理氣相沉積( EB-PVD)技術(shù)制備了TiAl/NiCoCrAl微層板復(fù)合材料，并對(duì)其在850 ℃空氣條件下的抗氧化性能進(jìn)行了研究，利用XRD和SEM對(duì)試樣進(jìn)行相組成和微觀結(jié)構(gòu)進(jìn)行分析。結(jié)果表明：TiAl/NiCoCrAl微層板具有較好的抗氧化性能，其恒溫氧化動(dòng)力學(xué)曲線均近似符合拋物線規(guī)律。而TiAl/NiCoCrAl微層板的高溫氧化機(jī)制為：表層的Al首先氧化生成多孔結(jié)構(gòu)的Al2O3單層膜；隨后內(nèi)部TiAl層中的Ti元素穿越NiCoCrAl層到達(dá)表面生成(TiO2 + Al2O3)的氧化層；最后NiCoCrAl層中的Ni和Cr會(huì)形成以Cr2O3和NiCr2O4相為主的致密的外層氧化膜，這是其抗氧化性能顯著提高的根本原因。

    Abstract:

    TiAl/NiCoCrAl microlaminated sheet prepared by EB-PVD have been oxygenized in air at 850 oC, and its oxidation property has been studied. The phase composition and microstructure have been analyzed by XRD and SEM. The results show TiAl/NiCoCrAl microlaminated sheet has good oxidation resistance and the oxidation kinetics curves follow the parabolic law. The oxidation mechanisms of TiAl/NiCoCrAl microlaminated sheet at high temperature is that Al on the surface will generate the Al2O3 monolayer oxide film with porous structure firstly, subsequently some Ti element in the inner TiAl layers will cross over the NiCoCrAl layers and reach the surface to generate the (TiO2 + Al2O3) oxide layer, and finally Ni and Cr in the NiCoCrAl layers can generate compact outer oxide film composed of Cr2O3 and NiCr2O4 phase, which is the essential reason why the oxidation resistance of the sheet increases obviously.

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陳貴清,張如炳,章德銘,鄒 豪. EB-PVD制備TiAl/NiCoCrAl微層板復(fù)合材料氧化性能研究[J].稀有金屬材料與工程,2012,41(1):120~123.[Chen Guiqing, Zhang Rubing, Zhang Deming, Zou Hao. Study on Oxidation Property of TiAl/NiCoCrAl Microlaminated Sheet Prepared by EB-PVD[J]. Rare Metal Materials and Engineering,2012,41(1):120~123.]
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  • 收稿日期:2011-01-15
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