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硫酸甲醇體系中電解拋光鉭的實(shí)驗(yàn)研究
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Experimental Study on Electropolishing of Tantalum in Sulfuric Acid-methanol
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    摘要:

    采用硫酸甲醇體系對鉭進(jìn)行電解拋光，并對其拋光性能進(jìn)行了研究，測定了不同配比時(shí)電解液中鉭的陽極極化曲線，研究了電解液配比和電壓對鉭表面質(zhì)量的影響。在攪拌速率為16 m/s、電解液溫度為0 ℃、時(shí)間為3 min、硫酸甲醇體積比為1:7時(shí)，電壓在20 V左右拋光效果較好、鉭表面均方根粗糙度Rq小于30 nm，不僅能夠滿足鉭材表面精飾加工需求，而且能夠滿足EOS靶用標(biāo)準(zhǔn)材料薄膜對表面質(zhì)量要求。

    Abstract:

    Sulfuric acid-methanol electrolytes were applied for the electropolishing of tantalum. The effects of electrolyte composition and voltage on the finish quality of tantalum were investigated. The optimum parameters for polishing tantalum are determined as follows: V(H2SO4):V(CH3OH) =1:7, voltage=~20 V when the stir speed is 16 m/s, and the electrolysis time is 3 min at 0 oC. The results show that RMS Rq of the polished tantalum is less than 30 nm and the requirement of tantalum surface and EOS thin film can be satisfied.

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張運(yùn)娟,邢丕峰,韋建軍,李朝陽,張淑洋.硫酸甲醇體系中電解拋光鉭的實(shí)驗(yàn)研究[J].稀有金屬材料與工程,2011,40(12):2184~2187.[Zhang Yunjuan, Xing Pifeng, Wei Jianjun, Li Chaoyang, Zhang Shuyang. Experimental Study on Electropolishing of Tantalum in Sulfuric Acid-methanol[J]. Rare Metal Materials and Engineering,2011,40(12):2184~2187.]
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  • 收稿日期:2010-12-19
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