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溫度對PLD法制備CIGS薄膜性能的影響
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深圳市傳感器技術重點實驗室開放基金 (SST200902);廣東省大學生創(chuàng)新實驗項目(1059010006)


Effect of Substrate Temperature on the Properties of CIGS Films Prepared by PLD Method
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    摘要:

    利用脈沖激光沉積(PLD)法在40~600 ℃范圍內(nèi),以石英為基底制備了系列銅銦鎵硒(CIGS)薄膜。利用分光光度計,XRD,SEM,EDS等對薄膜進行表征。結(jié)果表明,薄膜都以(112)擇優(yōu)取向生長,在40~400 ℃范圍內(nèi),溫度對薄膜結(jié)晶質(zhì)量、晶粒尺寸等影響不明顯;溫度達到600 ℃時,結(jié)晶質(zhì)量、晶粒尺寸及薄膜的紅外透光率等顯著增加。認為這主要與Ga元素的擴散受溫度的影響有關,溫度越高,Ga元素有足夠的能量進行充分擴散,并完成晶體結(jié)構(gòu)重組,同時分析了Se元素含量隨溫度變化的原因。

    Abstract:

    Copper indium gallium selenium (CIGS) films were prepared on quartz substrate within 40-600 °C by PLD method, and characterized by spectrophotometer, XRD, SEM and EDS. Results show that the films are grown with single chalcopyrite structure preferential (112) orientation, within 40-400 °C, the grains size, crystallization quality are almost not influenced with temperature, while the temperature reached 600 °C, grains size and crystal quality, the infrared light transmittance etc. increased significantly. These phenomena are mainly attributed to the effect of substrate temperature on the diffusion of the Ga elements, at high temperature, the diffusion is sufficient and the crystal structure reorganization is finished. The relationship between Se composition and temperature was also analyzed.

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胡居廣,林曉東,曹慧群,羅仲寬,李啟文,張一倩,刁雄輝.溫度對PLD法制備CIGS薄膜性能的影響[J].稀有金屬材料與工程,2011,40(10):1848~1851.[Hu Juguang, Lin Xiaodong, Cao Huiqun, Luo Zhongkuan, Li Qiwen, Zhang Yiqian, Diao Xionghui. Effect of Substrate Temperature on the Properties of CIGS Films Prepared by PLD Method[J]. Rare Metal Materials and Engineering,2011,40(10):1848~1851.]
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  • 收稿日期:2011-05-06
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