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納米晶體Ti表面磁控濺射SiC薄膜的干摩擦學性能
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江蘇大學優(yōu)秀學術青年骨干培養(yǎng)對象基金（1211110001）；江蘇省教育廳摩擦學重點實驗室基金（Kjsmcx06005）


Dry Tribological Properties of Magnetron Sputtered SiC Films on Nanocrystalline Titanium Substrate
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    摘要:

    采用室溫磁控濺射技術在納米晶體鈦（劇烈塑性變形制備）表面制備出碳化硅（SiC）薄膜，研究SiC薄膜的組織結(jié)構(gòu)、納米壓痕行為和摩擦磨損性能。結(jié)果表明：SiC薄膜具有納米尺度“疇”特征的表面形貌、高含量Si-C鍵、與基材間具有明顯且呈梯度的元素擴散、低的納米硬度（10.62 GPa）、低的彈性模量（83.34 GPa）和高的硬模比（0.128）。在1.96 N載荷、氮化硅球（半徑為2 mm）為對摩件、室溫空氣條件下，其磨損速率為10-5?mm3·m-1·N-1級、摩擦系數(shù)約為0.162，磨損后薄膜不出現(xiàn)裂紋和剝落。

    Abstract:

    SiC (carbon nitride) thin films were deposited on nanocrystalline titanium substrate (produced by severe plastic deformation) by magnetron sputtering technique at room temperature. The microstructure, nano-indentation and friction/wear properties of the SiC films were investigated. The results show that the SiC films are of nano-scale domain features for surface morphology, a large amount of Si-C bonds, good adhesion (with obvious and gradual film-substrate element diffusions as well as small film-substrate elastic modulus difference), low nano-hardness (10.62 GPa), low Young's modulus (83.34 GPa) and high hardness-to-modulus ratio (0.128). When sliding against Si3N4 ball (2 mm in radius) under room-temperature air condition and 1.96 N load, the SiC films exhibit the friction coefficient of about 0.162, and the special wear rate in the magnitude order of 10-5 mm3·m-1·N-1 with no film cracking and interface delaminating.

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許曉靜,郝欣妮,陸樹顯,卓劉成,夏登福.納米晶體Ti表面磁控濺射SiC薄膜的干摩擦學性能[J].稀有金屬材料與工程,2011,40(6):991~994.[Xu Xiaojing, Hao Xinni, Lu Shuxian, Zhuo Liucheng, Xia Dengfu. Dry Tribological Properties of Magnetron Sputtered SiC Films on Nanocrystalline Titanium Substrate[J]. Rare Metal Materials and Engineering,2011,40(6):991~994.]
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  • 收稿日期:2010-07-01
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