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磁控濺射Ni/Au/Pt多層膜紅外發(fā)射率特征研究
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固技術(shù)國(guó)家重點(diǎn)實(shí)驗(yàn)室自主研究課題(KP200901)


Study on Infrared Emissivity Characteristic of Ni/Au/Pt Multilayer Films by Magnetic Sputtering
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    摘要:

    研究了表面鍍Ni/Au/Pt多層膜的K424合金在熱處理前后紅外發(fā)射率的變化及變化機(jī)理。XRD分析結(jié)果表明，在熱處理后，試樣表面主要由 Au0.7Cr0.3和Pt組成，說明合金基體元素在600 ℃下會(huì)向外擴(kuò)散。SEM分析表明，粗糙表面鍍金膜的試樣在熱處理后，表面薄膜產(chǎn)生了細(xì)小的裂痕，但在表面沒有探測(cè)到氧化物。而拋光表面鍍金膜的試樣，其表面薄膜十分完整。通過SR5000光譜輻射計(jì)量?jī)x測(cè)量合金的紅外發(fā)射率，結(jié)果表明，合金的表面狀態(tài)和熱處理對(duì)紅外發(fā)射率均有較大影響

    Abstract:

    The infrared emissivity characteristics and change mechanism of the superalloy K424 deposited with Ni/Au/Pt multilayer films were studied. After heat processing at 600 oC for 150 h, the films were analyzed by X-ray diffraction (XRD), SEM and EDS. The results show that the main compositions on the surface are Au0.7Cr0.3 and Pt, indicating that the substrate elements diffuse into the multilayer films. SEM analysis shows that there are lots of fine cracks on the rough sample, but oxides are not detected, while the surface of the polished samples is integrity after heat processing. The infrared emissivity was tested by spectral radiometer SR5000. The results show that both the surface state and heat processing have an important influence on the infrared emissivity

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黃智斌,周萬城,唐秀鳳,羅 發(fā),朱冬梅.磁控濺射Ni/Au/Pt多層膜紅外發(fā)射率特征研究[J].稀有金屬材料與工程,2011,40(3):534~537.[Huang Zhibin, Zhou Wancheng, Tang Xiufeng, Luo Fa, Zhu Dongmei. Study on Infrared Emissivity Characteristic of Ni/Au/Pt Multilayer Films by Magnetic Sputtering[J]. Rare Metal Materials and Engineering,2011,40(3):534~537.]
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  • 收稿日期:2010-03-25
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