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電沉積寬晶粒尺寸分布納米鎳的本征拉伸行為
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福建省自然科學(xué)基金(E0410011);福建省科技計劃重點項目(2006H0020)資助


Intrinsic Tensile Behavior of Electrodeposited Nanocrystalline Ni with a Broad Grain Size Distribution
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    摘要:

    通過直流電沉積制備平均晶粒度為27.2 nm,寬晶粒尺寸分布(10~120 nm)的納米鎳(B-NC-Ni)。在B-NC-Ni的拉伸實驗中,存在著兩類不同的工程應(yīng)力-應(yīng)變曲線及宏觀斷口,結(jié)果表明:完整的拉伸曲線即本征曲線,具有恒應(yīng)力變形階段,宏觀斷口呈切斷;而不完整的拉伸曲線在平臺出現(xiàn)之前已發(fā)生斷裂,主要是由于電沉積時陰極析出的H可能會使鍍層形成空位和微孔兩類缺陷,均會加劇變形時晶界上裂紋的形成,宏觀斷口呈正斷。此外,實驗中雜質(zhì)S(0.015%, 質(zhì)量分數(shù), 下同)對B-NC-Ni的拉伸性能影響可忽略

    Abstract:

    Nanocrystalline Ni with a mean grain size of 27.2 nm and a broad grain size distribution ranging from 10 nm to 120 nm (B-NC-Ni) was prepared by direct current electrodeposition. In tensile experiments of B-NC-Ni, there are two types of engineering stress-strain curves and macroscopic fracture. Results reveal that a complete tensile curve, i.e. an intrinsic curve, possesses a constant stress deformation stage, and macrofracture is shear; a incomplete tensile curve shows premature plastic instability before the appearance of the flat plastic region, mainly because in the process of nickel deposition, flaws including vacancies and porosity may form in the deposit due to the cathode hydrogen evolution, resulting in more serious crack formation at the grain boundary during deformation, and the fracture is vertical shear. In addition, the effect of S impurities (0.015 wt%) on tensile properties can be neglected in the present work

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鄭耀東,戴品強,許偉長,胡樹韌.電沉積寬晶粒尺寸分布納米鎳的本征拉伸行為[J].稀有金屬材料與工程,2010,39(10):1845~1848.[Zheng Yaodong, Dai Pinqiang, Xu Weichang, Hu Shuren. Intrinsic Tensile Behavior of Electrodeposited Nanocrystalline Ni with a Broad Grain Size Distribution[J]. Rare Metal Materials and Engineering,2010,39(10):1845~1848.]
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  • 收稿日期:2009-10-23
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