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直流電沉積Ni-W-P鍍層研究
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Study on Direct-Current Electroplated Ni-W-P Layer
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    摘要:

    采用直流電沉積法,在低碳鋼表面成功沉積Ni-W-P鍍層。應用X射線熒光(XRF)、掃描電子顯微鏡(SEM)、俄歇電子能譜(AES)、X射線衍射(XRD)儀等方法,研究電流密度、鍍液pH值和鍍液溫度對Ni-W-P鍍層成分、表面形貌和結構的影響。結果表明,電流密度和鍍液pH值的變化對Ni-W-P鍍層成分的影響很大,而電流密度、鍍液pH值和溫度對鍍層厚度的影響較小。電流效率隨著電流密度和鍍液溫度的增大分別降低和升高,而隨著鍍液pH值的變化,在pH=7.0時有極大值。鍍液pH值對Ni-W-P鍍層結構有較大影響,在pH=8.0時,鍍層呈現明顯的Ni(111)峰,此時鍍層硬度達到極大值7130 MPa。在此基礎上,對Ni-W-P鍍層的電沉積機制做了進一步探討。

    Abstract:

    Ni-W-P layers were formed on a low-carbon steel substrate by direct-current electroplating method. The effects of current density, pH value and bath temperature on the composition, surface morphology, and microstructure of Ni-W-P layers were studied by X-ray fluorescence (XRF), scanning electron microscope (SEM), auger electron spectroscopy (AES) and X-ray diffraction (XRD). The results indicate that the change of current density and pH value influenced the composition of Ni-W-P layer greatly, but the change of current density, pH value and bath temperature hardly influenced the thickness of Ni-W-P layer. As current density and bath temperature increased, current efficiency decreased and increased, respectively, and current efficiency reached the maximum value when pH value is 7.0. The structure of Ni-W-P layer was greatly influenced by pH value, and a well-preferred orientation along Ni (111) direction was shown when pH value was 8.0. Synchronously, the microhardness of Ni-W-P layer reached the maximum value of 7130 MPa. At last, electroplating mechanism of Ni-W-P layer was discussed further.

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劉殿龍,楊志剛,劉 璐,張 弛.直流電沉積Ni-W-P鍍層研究[J].稀有金屬材料與工程,2010,39(1):60~64.[Liu Dianlong, Yang Zhigang, Liu Lu, Zhang Chi. Study on Direct-Current Electroplated Ni-W-P Layer[J]. Rare Metal Materials and Engineering,2010,39(1):60~64.]
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  • 收稿日期:2009-06-15
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