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鉭催化磁控濺射法制備GaN納米線
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Synthesis of GaN Nanowires with Tantalum Catalyst by Magnetron Sputtering
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    摘要:

    利用磁控濺射技術(shù)通過氨化Ga2O3/Ta薄膜,合成大量的一維單晶纖鋅礦型氮化鎵納米線。用X射線衍射、掃描電子顯微鏡、高分辨透射電子顯微鏡,選區(qū)電子衍射和光致發(fā)光譜對制備的氮化鎵進行了表征。結(jié)果表明:制備的GaN納米線是六方纖鋅礦結(jié)構(gòu),其直徑大約20~60 nm,其最大長度可達10 μm左右。室溫下光致發(fā)光譜測試發(fā)現(xiàn)363 nm處的較強紫外發(fā)光峰。另外, 簡單討論了氮化鎵納米線的生長機制

    Abstract:

    Single crystalline wurzite GaN nanowires were synthesized through ammoniating Ga2O3/Ta films by RF magnetron sputtering. The products were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), high-resolution transmission electron microscopy (HRTEM), selected-area electron diffraction (SAED) and photoluminescence (PL). The results show that the nanowires have a hexagonal wurtzite structure with diameters ranging from 20 nm to 60 nm and lengths typically up to 10 μm. The PL spectrum exhibits a strong UV light emission at 363 nm. The growth mechanism of the crystalline GaN nanowires is discussed briefly

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薛成山,李 紅,莊惠照,陳金華,楊兆柱,秦麗霞,王 英,王鄒平.鉭催化磁控濺射法制備GaN納米線[J].稀有金屬材料與工程,2009,38(7):1129~1131.[Xue Chengshan, Li Hong, Zhuang Huizhao, Chen Jinhua, Yang Zhaozhu, Qin Lixia, Wang Ying, Wang Zouping. Synthesis of GaN Nanowires with Tantalum Catalyst by Magnetron Sputtering[J]. Rare Metal Materials and Engineering,2009,38(7):1129~1131.]
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  • 收稿日期:2008-06-20
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