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鎳鈦合金表面鋯膜磁控濺射制備與組織結(jié)構(gòu)研究
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國家“863”計劃項目（2006AA03Z445）；教育部新世紀優(yōu)秀人才支持計劃（NCET-06-0464）；江蘇省自然科學基金（BK2007515）


Preparation of Zirconium Film on NiTi Shape Memory Alloy Surface by Magnetron Sputtering and Investigation of Its Structure
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    摘要:

    通過直流平衡磁控濺射法在NiTi 形狀記憶合金基底上制備純Zr膜，并采用SEM、XRD、XPS等對Zr膜的組織結(jié)構(gòu)進行研究。結(jié)果表明：Zr膜具有晶帶T型結(jié)構(gòu)，組織保持細小致密的纖維狀特征，沒有空洞和錐狀形態(tài)，表面平整，與基體結(jié)合良好；膜和其塊體Zr靶材晶體結(jié)構(gòu)一致，出現(xiàn)少量的生物惰性ZrO2陶瓷相。最后，對磁控濺射沉積Zr膜的機制進行了探討。

    Abstract:

    Pure Zr metal film was deposited on the surface of NiTi shape memory alloy by balanced magnetron DC sputtering and the microstructure of the Zr film was investigated by SEM, XRD and XPS methods. It is found that the Zr film has the T-type crystal band structure with a fine and dense fibre character. There are no pores and prick form. The film has good combination with NiTi substrate and a flatness surface. The crystal structure of the film is identical with its bulk Zr target except for a little bioinert ZrO2 phase. Finally the depositing mechanism of the Zr film by magnetron sputtering is discussed.

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吉宏林,儲成林,王如萌,張旭海,張文艷,董寅生,郭 超,盛曉波,林萍華,朱劍豪.鎳鈦合金表面鋯膜磁控濺射制備與組織結(jié)構(gòu)研究[J].稀有金屬材料與工程,2009,38(2):295~298.[Ji Honglin, Chu Chenglin, Wang Rumang, Zhang Xuhai, Zhang Wenyan, Dong Yinsheng, Guo Chao, Sheng Xiaobo, Lin Pinghua, Paul K. Chu. Preparation of Zirconium Film on NiTi Shape Memory Alloy Surface by Magnetron Sputtering and Investigation of Its Structure[J]. Rare Metal Materials and Engineering,2009,38(2):295~298.]
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  • 收稿日期:2008-01-27
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