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復合電沉積Ni-MWCNTs及鎳電結晶的研究
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國家自然科學基金資助（20576126）；河南省自然科學基金資助（072300420010）


Composite Electrodeposit of Ni-MWCNTs and the Electrocrystallization of Nickel
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    摘要:

    研究了水平陰極方式復合電沉積Ni-MWCNTs(Ni-多壁碳納米管)。采用硫酸鎳基礎電解液，添加適當表面活性劑和光亮劑，MWCNTs為2~2.5 g/L，電流密度為2.5 A/dm2時，獲得的Ni-MWCNTs沉積層結構致密，復合沉積層中MWCNTs含量達22.45％。復合電沉積層表面微觀形貌照片顯示，MWCNTs在復合電沉積層中占主要體積，鎳的電結晶形態(tài)呈球形，結晶點位置位于MWCNTs管壁缺陷處及部分管端處，MWCNTs的管端和管壁缺陷處的Ni晶粒相互連接，形成牢固的復合沉積層。復合電沉積層中MWCNTs含量受電解液中MWCNTs濃度、電流密度以及光亮劑影響，在MWCNTs上的Ni沉積層連續(xù)性直接受MWCNTs管壁上缺陷的數(shù)量和連續(xù)性影響，形成晶核的缺陷尺度至少在1 nm以上

    Abstract:

    Multiwall carbon nanotubes (MWCNTs) were prepared by composite electrodeposit in a horizontal cathode mode. The electrodeposited MWCNTs have dense structure with a MWCNTs content of 22.45 % when using sulfuric nickel electrolyte, surface active solvent and brightener in a MWCNT content of 2~2.5 g/L and a voltaic density of 2.5 A/dm2. The SEM results show that the MWCNTs occupy the main volume of composite electrodepositing coating with sphere morphology for the Ni electrocrystallization. The crystallization occurs on the sunken part and the top of tubes where the Ni grains are connected each other to form a solid composite electrodeposits connecting the MWCNTs matrix and crystals. The MWCNTs content of composite electrodeposition are dominated by the MWCNTs concentration, the voltaic density and the brightener, while the connection of nickel deposition layer is dominated by the defects number and the connection of MWCNTs, and the shortest length of defect should be 1 nm at least for nucleation

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馮 輝,張 勇,衛(wèi)應亮,陳儉民,崔亞鋒,張?zhí)煊?馮少彬.復合電沉積Ni-MWCNTs及鎳電結晶的研究[J].稀有金屬材料與工程,2009,38(2):229~232.[Feng Hui, Zhang Yong, Wei Yingliang, Chen Jianmin, Cui Yafeng, Zhang Tianji, Feng Shaobin. Composite Electrodeposit of Ni-MWCNTs and the Electrocrystallization of Nickel[J]. Rare Metal Materials and Engineering,2009,38(2):229~232.]
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  • 收稿日期:2008-01-23
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