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功率對磁控濺射TbDyFe薄膜磁致伸縮性能的影響
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TM271

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國防預(yù)研基金資助（5148902065JS9105）


Influence of Sputtering Power on Magnetostrictive Performance of TbDyFe Films Grown by Magnetron Sputtering
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    摘要:

    采用直流磁控濺射工藝制備TbDyFe磁致伸縮薄膜，通過考察薄膜成分及其微結(jié)構(gòu)，分析研究了濺射功率對薄膜磁致伸縮性能的影響。結(jié)果表明，同一薄膜內(nèi)部成分相當(dāng)均一，但不同濺射功率條件下的薄膜成分相異。濺射功率較低，薄膜內(nèi)部微柱狀體結(jié)構(gòu)導(dǎo)致了磁各向異性的產(chǎn)生，磁致伸縮性能下降；濺射功率提高到120W，微柱狀體結(jié)構(gòu)消失，薄膜內(nèi)部趨于均一連續(xù)，磁致伸縮性能較好。

    Abstract:

    TbDyFe thin films were grown on silicon substrates by DC magnetron sputtering. The influence of sputtering power on magnetostrictive performance of TbDyFe films was studied by the composition and the microstructure of films. The results show that the composition of films varies with the sputtering powers, which results in the different magnetostrictive performances for different films. At lower sputtering powers, the films exhibit the microstructure of micro-cylinders with magnetic anisotropy from the nearly vertical direction to the substrate surface direction, as a result, the magnetostriction of films is significantly reduced. When sputtering power is up to 120 W, the films become homogeneous without any micro-cylinder, exhibiting good magnetostrictive performances.

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劉吉延 馬世寧 喬玉林 李長青.功率對磁控濺射TbDyFe薄膜磁致伸縮性能的影響[J].稀有金屬材料與工程,2007,36(7):1272~1274.[Liu Jiyan, Ma Shining, Qiao Yulin, Li Changqing. Influence of Sputtering Power on Magnetostrictive Performance of TbDyFe Films Grown by Magnetron Sputtering[J]. Rare Metal Materials and Engineering,2007,36(7):1272~1274.]
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