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CuCr25納米晶化對(duì)真空電弧陰極斑點(diǎn)擴(kuò)散的影響
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TM201.44

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國(guó)家自然科學(xué)基金(50071043,50271050)資助


Influence of Nanocrystallization of CuCr25 on Spot Diffusion of Cathode by Vacuum Arc
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    摘要:

    采用氬氣保護(hù)氣氛高能球磨和真空熱壓技術(shù)制備了致密度大于98%的納米晶CuCr25合金,并在真空室內(nèi)進(jìn)行擊穿試驗(yàn)。采用掃描電鏡對(duì)納米晶和粗晶CuCr25合金陰極斑點(diǎn)蝕坑形貌進(jìn)行觀察。結(jié)果表明:粗晶CuCr25合金真空電弧陰極斑點(diǎn)擴(kuò)散表現(xiàn)為原地重復(fù)燃燒或整體的跳躍式移動(dòng),且有選擇地分布在Cr相。而納米晶CuCr25合金由于晶粒細(xì)化(〈50nm),為電子發(fā)射提供了優(yōu)越條件,陰極斑點(diǎn)的擴(kuò)散表現(xiàn)為次級(jí)斑點(diǎn)的此起彼伏的準(zhǔn)連續(xù)移動(dòng),擊穿相均勻分布在整個(gè)陰極表面。

    Abstract:

    The nano-crystalline CuCr25 alloys have been prepared and the breakdown experiments have been done in vacuum room. The traces of cathode spots on the surface of coarse-crystalline and nano-crystalline CuCr25 alloys have been observed using a scanning electron microscope (SEM). Experimental results show that the spot diffusion of coarse-crystalline CuCr25 cathode local iterative combustion or whole jumping move on the Cr phases with a weak voltage withstanding. But the spot diffusion of nanocrystallization of CuCr25 cathode exhibits quasi-continuous move, as one falls and another rises, due to the superior condition for electron emission, and the breakdown phase distributing on the whole cathode surface.

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馮宇 卜濤 王紅理 張程煜 丁秉鈞. CuCr25納米晶化對(duì)真空電弧陰極斑點(diǎn)擴(kuò)散的影響[J].稀有金屬材料與工程,2007,36(5):929~932.[Feng Yu, Bo Tao, Wang Hongli, Zhang Chengyu, Ding Bingjun. Influence of Nanocrystallization of CuCr25 on Spot Diffusion of Cathode by Vacuum Arc[J]. Rare Metal Materials and Engineering,2007,36(5):929~932.]
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  • 最后修改日期:2006-07-04
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