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磁控濺射氮分壓對(duì)Nb-Si-N薄膜結(jié)構(gòu)和性能的影響
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TG146.4

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國(guó)家重點(diǎn)基礎(chǔ)研究發(fā)展計(jì)劃“973”項(xiàng)目（004CB619302）;國(guó)家自然科學(xué)基金（NSFC）（50471035）;光電技術(shù)與智能控制教育部重點(diǎn)實(shí)驗(yàn)室（蘭州交通大學(xué)）開(kāi)放基金資助項(xiàng)目（K040119）


The Effect of N2 Partial Pressure on the Microstructure and Properties of Nb-Si-N Films
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    摘要:

    用反應(yīng)磁控濺射法在不同的氮分壓下沉積了Nb-Si-N薄膜.結(jié)果表明：Nb-Si-N膜的成分、結(jié)構(gòu)和性能隨氮分壓的改變而不同.隨氮分壓的增加,Nb-Si-N膜的Nb/Si比和表面粗糙度減小;薄膜的電阻值和微硬度增加.Nb-Si-N膜的結(jié)構(gòu)為納米晶NbN與類(lèi)似Si3N4非晶相組成的納米復(fù)合結(jié)構(gòu),且隨著氮分壓的增加,Nb-Si-N膜的非晶傾向增強(qiáng),晶粒尺寸減小.

    Abstract:

    The Nb-Si-N films were deposited by reactive magnetron sputtering with different N2 partial pressures. The result showed that the composition, microstructure and properties of the Nb-Si-N films depend strongly on the N2 partial pressure. As the N2 partial pressure increasing, the Nb/Si ratio and the surface roughness decease, but the bulk resistance and microhardness of the Nb-Si-N films increase. The microstructure of Nb-Si-N films is a nano-composite structure consisting of nano-sized NbN crystallites and amorphous Si3N4-like compound of Si-N. With the increase of N2 partial pressure, the amorphous tendency of Nb-Si-N films increases and the grain size decreases.

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王劍鋒 宋忠孝 徐可為 范多旺.磁控濺射氮分壓對(duì)Nb-Si-N薄膜結(jié)構(gòu)和性能的影響[J].稀有金屬材料與工程,2006,35(6):978~981.[Wang Jianfeng, Song Zhongxiao, Xu Kewei, Fan Duowang. The Effect of N2 Partial Pressure on the Microstructure and Properties of Nb-Si-N Films[J]. Rare Metal Materials and Engineering,2006,35(6):978~981.]
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  • 收稿日期:2005-07-12
  • 最后修改日期:2005-07-12
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