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KF-KCl熔體中電沉積TiB2鍍層
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TQ134.11

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Project supported by the National Natural Science Foundation of China (50204006)


Preparation of TiB2 Coatings by Electroplating in KF-KCl Molten Salt
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    摘要:

    在鋁工業(yè)中TiB2是一種非常有前途的陰極內(nèi)襯取代材料.本研究首先通過熱力學(xué)分析驗證了在Ti-B-C體系生成TiB2的可能性,然后在K2TiF6和KBF4作為活性物質(zhì)的KF-KCl熔體中以石墨為基體通過直流電沉積(CCP)和周期斷開電流電沉積(PIC)技術(shù)制備了TiB2鍍層,并且研究了電流密度和電鍍技術(shù)對鍍層表面平整度、致密度和晶粒尺寸的影響.結(jié)果表明,當電流密度為0.8 A/cm2時,能夠得到厚度均勻且和基體具有良好附著的TiB2鍍層;和CCP相比,采用PIC技術(shù)制備的TiB2鍍層表面平整度和致密度都得到明顯改善,并且晶粒也更為細小.XRD分析表明鍍層由相對純凈的TiB2組成,并且鍍層擇優(yōu)取向均為(001)面,這和二維晶核理論的預(yù)測相吻合.

    Abstract:

    Titanium diboride (TiB2) appears to be a promising material for corrosion prevention in aluminium industries. This paper first predicted the possibility of TiB2 formation in Ti-B-C system, and then focused on the preparation of TiB2 coatings by electroplating on the graphite in fluoride-chloride electrolytes (KF-KCl) containing K2TiF6 and KBF4 as the electrochemically-active components. The effect of current density and electroplating techniques on the surface leveling, compaction and grain size of coatings was investigated. The results show thick, adherent and uniform TiB2 coatings are obtained when the current density is 0.8 A/cm2; compared with continuous current plating (CCP), the surface leveling and compaction of coatings deposited by periodically interrupted current (PIC) are remarkably improved, and the crystal grain is finer. XRD analysis indicats that the coatings are composed of relatively pure TiB2 and the preferred orientation of coatings is (001) plane under experimental conditions, which is in accordance with the prediction of the two-dimensional crystal nuclei theory.

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李軍 李冰 江盧山 葉以富 董政娥. KF-KCl熔體中電沉積TiB2鍍層[J].稀有金屬材料與工程,2006,35(4):629~633.[. Preparation of TiB2 Coatings by Electroplating in KF-KCl Molten Salt[J]. Rare Metal Materials and Engineering,2006,35(4):629~633.]
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  • 最后修改日期:2004-09-10
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