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熱處理對(duì)TiO_2濺射薄膜結(jié)構(gòu)和光譜性能的影響
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TG156

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國家“863”項(xiàng)目(2003lg0034)


The Effect of the d-Electron Transition on UV-Vis Spectra and PL Spectra of TiO_2 Films
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    摘要:

    用直流反應(yīng)磁控濺射法制備了TiO2薄膜,并對(duì)熱處理前后試樣的紫外可見光譜(UV-Visspectrum)和熒光發(fā)射光譜(PLSpectrunm)做了研究。發(fā)現(xiàn)熱處理后試樣的紫外可見光譜在496nm處出現(xiàn)了一個(gè)較為明顯的吸收峰,熒光發(fā)射光譜496.5nm處出現(xiàn)一個(gè)熒光發(fā)射帶肩。X射線光電子能譜(XPS)的分析結(jié)果表明,熱處理可使薄膜中晶格氧擴(kuò)散出去,生成Ti3+離子和氧空位。結(jié)合XPS的分析結(jié)果和理論計(jì)算,可推斷熱處理后出現(xiàn)的位于496nm處的吸收峰和496.5nm處的熒光帶肩可被指認(rèn)為薄膜中Ti3+離子的d電子躍遷產(chǎn)生。

    Abstract:

    TiO2 films were prepared by dc reactive magnetron sputtering. The UV-Vis spectra and PL spectra of samples before and after heat treatment were studied in detail. An absorption peak (496 nm) in UV-Vis spectra and an emission shoulder (496.5 nm) in PL spectra are observed clearly. The analysis of X-ray photoelectron spectroscopy (XPS) indicates that the lattice oxygen can be removed by heat treatment to form the Ti3+ and oxygen vacancies. Taking the XPS analysis and theory calculation into consideration together, it can be concluded that the absorption peak (496 nm) in UV-Vis spectra and the emission shoulder (496.5 nm) in PL spectra are attributed to the d-electron transition of Ti3+ in TiO2 films.

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劉保順,何鑫,趙修建,趙青南.熱處理對(duì)TiO_2濺射薄膜結(jié)構(gòu)和光譜性能的影響[J].稀有金屬材料與工程,2005,34(9).[Liu Baoshun, He Xin, Zhao Xiujian, Zhao Qingnan. The Effect of the d-Electron Transition on UV-Vis Spectra and PL Spectra of TiO_2 Films[J]. Rare Metal Materials and Engineering,2005,34(9).]
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