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Preparation and Properties of GaN Micro-Ribbons on Ga-Diffused Si (111) Substrates
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TN304

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Supported by the Key Research Program of National Natural Science Foundation of China (90201025) and the National Natural Science Foundation of China (60071006)


Preparation and Properties of GaN Micro-Ribbons on Ga-Diffused Si (111) Substrates
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    摘要:

    用射頻磁控濺射工藝在室溫?cái)U(kuò)鎵硅襯底上沉積Ga2O3膜,然后在氨氣氣氛下氮化Ga2O3膜得到GaN微米帶,用X射線衍射(XRD)、掃描電鏡(SEM)、選區(qū)電子衍射(SAED)、X射線光電子能譜(XPS)及光致發(fā)光譜(PL)對(duì)薄膜樣品進(jìn)行了結(jié)構(gòu)、表面形貌、組分及發(fā)光特性分析.SEM圖像顯示直徑約為100 nm~300 nm微米帶隨機(jī)分布在GaN薄膜表面.XRD、XPS及SAED分析表明GaN微米帶呈六方閃鋅礦多晶結(jié)構(gòu),擇優(yōu)沿[001]方向生長(zhǎng).P1顯示了可能由量子限制效應(yīng)引起的發(fā)光峰,其相對(duì)于報(bào)道的GaN晶體發(fā)光峰有顯著藍(lán)移.

    Abstract:

    Hexagonal GaN micro-ribbons were synthesized through nitriding Ga2O3 films under flowing ammonia. Ga2O3 films were deposited on the Ga-diffused Si (111) substrates by radio frequency (r.f.) magnetron sputtering. X-ray diffraction (XRD), scanning electron microscopy (SEM), selected area electron diffraction (SAED); X-ray photo electronic spectrometer (XPS) and photoluminescence (PL) spectroscopy were used to characterize the structure, surface morphology, composition and optical property of the synthesized samples. SEM images show that GaN micro-ribbons with 100-300rim in diameter are randomly distributed on the uniform films. XRD, XPS and SAED analysis suggest the micro-ribbons are polycrystalline GaN with hexagonal structure and preferentially grow in the [001] direction. The PL spectrum has a remarkable blue shift compared with the reported values of bulk GaN, which might be ascribed to quantum confinement effects.

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薛成山 孫振翠 魏芹芹 曹文田 莊惠照. Preparation and Properties of GaN Micro-Ribbons on Ga-Diffused Si (111) Substrates[J].稀有金屬材料與工程,2005,34(7):1162~1165.[XueChengshan SunZhencui WeiQinqin CaoWentian ZhuangHuizhao. Preparation and Properties of GaN Micro-Ribbons on Ga-Diffused Si (111) Substrates[J]. Rare Metal Materials and Engineering,2005,34(7):1162~1165.]
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  • 最后修改日期:2004-09-02
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