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磁控濺射氧化釩薄膜的相成分及電阻-溫度特性
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TN304

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國家自然科學(xué)基金資助(50272019)，哈爾濱工業(yè)大學(xué)校基金資助(HIT.2001.15)


Phase Compositions and Resistance-Temperature Characteristic of VOx Thin Films by Magnetron Sputtering
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    摘要:

    采用磁控濺射法在p-Si(100)襯底上制備了VOx薄膜。利用X射線衍射(XRD)分析、原子力顯微鏡(AFM)及四探針測試方法，研究了制備工藝條件對薄膜的相成分和電阻．溫度特性的影響，并測試分析了薄膜的電學(xué)熱穩(wěn)定性。結(jié)果表明：通過這種方法制備的氧化釩薄膜具有較高的電阻溫度系數(shù)及良好的電學(xué)熱穩(wěn)定性，可作為微測輻射熱計(jì)的熱敏材料。

    Abstract:

    Thin VOx films were prepared by magnetron sputtering onto p-Si(100) substrates. X-ray diffraction (XRD), atomic force microscope(AFM) and four-point probe method were employed to study the influence of the preparation parameters on the phase composition and resistance-temperature characteristic of VOx. The thermal stability of the films was also investigated. The results show that VOx films prepared by this method have relatively high temperature coefficient of resistance (TCR) and perfect thermal stability. They are promising to be used as thermal sensor materials in the microbolometer.

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王銀玲 李美成 趙連城.磁控濺射氧化釩薄膜的相成分及電阻-溫度特性[J].稀有金屬材料與工程,2005,34(7):1077~1080.[Wang Yinling, Li Meicheng, Zhao Liancheng. Phase Compositions and Resistance-Temperature Characteristic of VOx Thin Films by Magnetron Sputtering[J]. Rare Metal Materials and Engineering,2005,34(7):1077~1080.]
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  • 最后修改日期:2003-11-27
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