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CuCr觸頭材料小電流下陰極斑點(diǎn)與截流值研究
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TM503.5 TM501.2

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國(guó)家“863”計(jì)劃引導(dǎo)項(xiàng)目資助(2003AA001047) 國(guó)家自然科學(xué)基金資助(50071043)


Cathode Spots and Chopping Current in Vacuum and at Low Current for CuCr Contact Materials
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    摘要:

    研究了在峰值電流分別為10A和80A的小擊穿電流下，CuCr25與CuCr50合金陰極斑點(diǎn)蝕坑形貌的差異。通過比較陰極斑點(diǎn)蝕坑的大小和分布，分析了CuCr觸頭材料顯微組織中Cr相尺寸的大小對(duì)陰極斑點(diǎn)運(yùn)動(dòng)和蝕坑形貌的影響。采用示波器直接測(cè)量出截流值和電弧壽命，結(jié)合CuCr合金陰極斑點(diǎn)蝕坑形貌的分布，從現(xiàn)象和機(jī)理上解釋了CuCr25合金截流值低于CuCr50合金的原因。這些結(jié)果對(duì)通過優(yōu)化CuCr合金的顯微組織以降低觸頭材料的截流值提供了有力的依據(jù)。

    Abstract:

    The discrimination between CuCr25 and CuCr50 alloys for the cathode spot craters with peak currents of 10 A and 80 A has been studied in this paper. The microstructure analysis showed that the CuCr alloys has an important effect on the discrimination, in which the size of Cr phase plays an main role in effecting the moving direction and distribution of cathode spot craters. It can well be explained why the chopping current of CuCr25 is less than CuCr50 by the direct measurements of chopping current and arc lifetime by oscillograph. All above useful conclusions will provide powerful supports on decreasing chopping current by minimizing the size of Cr phase for CuCr alloys.

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段文新 郭聰慧 楊志懋 丁秉鈞. CuCr觸頭材料小電流下陰極斑點(diǎn)與截流值研究[J].稀有金屬材料與工程,2005,34(6):998~1001.[Duan Wenxin, Guo Conghui, Yang Zhimao, Ding Bingjun. Cathode Spots and Chopping Current in Vacuum and at Low Current for CuCr Contact Materials[J]. Rare Metal Materials and Engineering,2005,34(6):998~1001.]
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