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在石墨基體上電沉積TiB2鍍層的研究
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TG146.4

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國家自然科學基金資助項目(50204006)


Study on Electrodeposition of TiB2 Coating on Graphite Substrate
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    摘要:

    采用K2TiFe-KBF4-KF-KCl融鹽體系在石墨基體上電沉積制備TiB2鍍層?？疾炝祟A電解條件和電活性組分的含量對鍍層性能的影響。實驗結果表明：預電解對鍍層的組成影響較大；在K2TiF6與KBF4的摩爾比為1：2．5，并且其總含量較高的條件下，鍍層與基體結合力好，重復性好，但是晶粒較大，含有少量雜質；在K2TiF6與KBF4的摩爾比為1：7．5，并且其總含量較低的條件下，得到的鍍層晶粒細小，有金屬光澤，TiB2的純度很高，但是重復性較差。需要進一步進行電化學實驗，明確電沉積的機理。

    Abstract:

    In this paper TiB2 coating was electrodeposited on the graphite by K2TiF6-KBF4-KF-KCl molten salts. The effects of pre-electrolysis conditions and electroactive component contents on the properties of coating were tested. The results showed that: pre-electrolysis conditions had important effect on the compositions of coating; as the mole ratio of K2TiF6 and KBF4is 1:2.5 with higher total content of K2TiF6-KBF4, the coating had better adhension to the substrate and the process had good repetition, but the crystal particle was large and the coating has less impurity; as the mole ratio of K2TiF6 and KBF4is 1:7.5 with lower total content of K2TiF6- KBF4, the coating had fine crystal particle and higher TiB2 content with metallic gloss, but the process had bad repetition. Further electrochemistry experiments need to be done to find the mechanism and stable conditions for electrodepositing of TiB2 coating.

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李冰 邱竹賢 李軍 葉以富 趙祖欣.在石墨基體上電沉積TiB2鍍層的研究[J].稀有金屬材料與工程,2004,33(7):764~767.[Li Bing, Qiu Zhuxian, Li Jun, Ye Yifu, Zhao Zhuxin. Study on Electrodeposition of TiB2 Coating on Graphite Substrate[J]. Rare Metal Materials and Engineering,2004,33(7):764~767.]
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  • 最后修改日期:2002-12-24
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