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反應(yīng)濺射中靶面附近的粒子輸運(yùn)研究
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TN304.05

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國家自然科學(xué)基金資助項(xiàng)目(19874022)，廣西自然科學(xué)基金資助項(xiàng)目(9912004)


Study on Particle Transport Near the Target Surface in Reactive Sputtering
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    摘要:

    列出了各類粒子的產(chǎn)生、輸運(yùn)和它們同靶表面反應(yīng)的速率方程，并計(jì)及高能中性粒子對靶面濺射的剝離速率方程，有關(guān)方程耦合后求解濺射速率與氣體流量和放電電流的關(guān)系。本文強(qiáng)調(diào)反應(yīng)粒子的反應(yīng)碰撞，論述了從粒子輸運(yùn)出發(fā)探討薄膜生長方法的優(yōu)點(diǎn)。

    Abstract:

    The rate equations for particle produce, transport, and reaction with target surface, and sputtering peeling of ion and neutral particles with high energy are established. After these equations coupling up and taking account of other calculations, such as energy distribution functions, macroscopic flow velocity of gas, etc., the relation curves between sputtering rate and inlet flow of reaction gas for different discharge current are obtained. and the advantages of this analysis method are also discussed in the paper.

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陶甫延 王敬義 等.反應(yīng)濺射中靶面附近的粒子輸運(yùn)研究[J].稀有金屬材料與工程,2003,(2):99~102.[Tao Futing, Wang Jingyi, He Xiaoming, Wang Yu, Ying Sheng. Study on Particle Transport Near the Target Surface in Reactive Sputtering[J]. Rare Metal Materials and Engineering,2003,(2):99~102.]
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