The compound fraction of target surface was gotten from the rate equation s of sputtering and the transport equations of reactive particles .All of these equations are expressed by the constructional parameters of the chamber and macroscopic technology parameters.The calculating results from the TiN thin films deposited by reactive sputtering are well fit with the experim ental data.The methodes pro-vided in this paper will be benefit to the implementation of technology op timum as a new engineering methodes.
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陶甫廷 王敬義 等.靶面化合物覆蓋度的計算方法研究[J].稀有金屬材料與工程,2003,(1):13~17.[Tao Futing, Wang Jingyi, He Xiaoming, Wang Yu . Calculation Method for the Compound Fraction of Target Surface[J]. Rare Metal Materials and Engineering,2003,(1):13~17.] DOI：[doi]