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離子束輔助磁控濺射沉積TiN薄膜的研究
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TG174.444

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國(guó)家自然科學(xué)基金資助項(xiàng)目 (5 99710 3 5 )


Ion-beam Assisted Magnetron Sputtering Deposition of Titanium Nitride Films
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    摘要:

    利用三離子束輔助沉積設(shè)備，以離子束輔助沉積、磁控濺射和離子束輔助磁控濺射幾種工藝在GCr15基體上沉積TiN薄膜。實(shí)驗(yàn)結(jié)果表明：離子束輔助磁控濺射有效地提高了薄膜的硬度、耐磨性和耐蝕性，改善了膜基結(jié)合力。

    Abstract:

    Titanium nitride films were deposited by ion beam assisted deposition, magnetron sputtering and ion-beam assisted magnetron sputtering deposition on GCr15 and Si substrate. The structure and mechanical properties such as micro-hardness, bonding strength, wear resistance were studied as well as the corrosion resistance. The results show that the hardness, bonding strength and wear resistance of the titanium nitride films deposited by ion-beam assisted magnetron sputtering are increased greatly and the corrosion resistance of films is also improved.

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黃鶴 王學(xué)剛 等.離子束輔助磁控濺射沉積TiN薄膜的研究[J].稀有金屬材料與工程,2002,(3):205~208.[Huang He, Wang Xuegang, Zhu Xiaodong, Chen Hua, He Jiawen. Ion-beam Assisted Magnetron Sputtering Deposition of Titanium Nitride Films[J]. Rare Metal Materials and Engineering,2002,(3):205~208.]
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  • 最后修改日期:2001-03-26
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